Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9472419 | Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon | 2016-10-18 |
| 9418995 | Method and structure for transistors using gate stack dopants with minimal nitrogen penetration | Balaji Kannan, Unoh Kwon | 2016-08-16 |
| 9343372 | Metal stack for reduced gate resistance | Ruqiang Bao, Unoh Kwon, Keith Kwong Hon Wong | 2016-05-17 |
| 9330938 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon | 2016-05-03 |