| 9530651 |
Replacement metal gate finFET |
Sanjay C. Mehta, Junli Wang, Chun-Chen Yeh, Stefan Schmitz |
2016-12-27 |
| 9515073 |
III-V semiconductor CMOS FinFET device |
Alexander Reznicek, Devendra K. Sadana, Charan V. Surisetty |
2016-12-06 |
| 9514948 |
Stratified gate dielectric stack for gate dielectric leakage reduction |
Paul C. Jamison |
2016-12-06 |
| 9496183 |
Selective thickening of pFET dielectric |
Takashi Ando, Barry P. Linder |
2016-11-15 |
| 9490255 |
Complementary metal oxide semiconductor replacement gate high-k metal gate devices with work function adjustments |
Lisa F. Edge, Paul C. Jamison, Vamsi K. Paruchuri |
2016-11-08 |
| 9484439 |
III-V fin on insulator |
Kangguo Cheng, Alexander Reznicek |
2016-11-01 |
| 9472408 |
Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress |
Takashi Ando, Veeraraghavan S. Basker, Johnathan E. Faltermeier, Tenko Yamashita |
2016-10-18 |
| 9472419 |
Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme |
Takashi Ando, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram |
2016-10-18 |
| 9472407 |
Replacement metal gate FinFET |
Sanjay C. Mehta, Junli Wang, Chun-Chen Yeh, Stefan Schmitz |
2016-10-18 |
| 9437436 |
Replacement metal gate FinFET |
Sanjay C. Mehta, Junli Wang, Chun-Chen Yeh, Stefan Schmitz |
2016-09-06 |
| 9425080 |
Non-volatile memory device employing semiconductor nanoparticles |
Kangguo Cheng, Robert H. Dennard, Ali Khakifirooz, Tak H. Ning, Ghavam G. Shahidi |
2016-08-23 |
| 9412596 |
Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress |
Takashi Ando, Veeraraghavan S. Basker, Johnathan E. Faltermeier, Tenko Yamashita |
2016-08-09 |
| 9406679 |
Integration of multiple threshold voltage devices for complementary metal oxide semiconductor using full metal gate |
Lisa F. Edge, Balasubramanian S. Haran |
2016-08-02 |
| 9397197 |
Forming wrap-around silicide contact on finFET |
Dechao Guo, Zuoguang Liu, Shogo Mochizuki |
2016-07-19 |
| 9385207 |
Stratified gate dielectric stack for gate dielectric leakage reduction |
Paul C. Jamison |
2016-07-05 |
| 9356121 |
Divot-free planarization dielectric layer for replacement gate |
Sanjay C. Mehta |
2016-05-31 |
| 9330938 |
Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme |
Takashi Ando, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram |
2016-05-03 |
| 9318581 |
Forming wrap-around silicide contact on finFET |
Dechao Guo, Zuoguang Liu, Shogo Mochizuki |
2016-04-19 |
| 9299706 |
Single source/drain epitaxy for co-integrating nFET semiconductor fins and pFET semiconductor fins |
Alexander Reznicek |
2016-03-29 |
