Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502411 | Strained finFET device fabrication | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie | 2016-11-22 |
| 9472506 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Fee Li Lie | 2016-10-18 |
| 9305845 | Self-aligned quadruple patterning process | Matthew E. Colburn, Sivananda K. Kanakasabapathy, Fee Li Lie | 2016-04-05 |
| 9293375 | Selectively grown self-aligned fins for deep isolation integration | Kevin S. Petrarca, Theodorus E. Standaert | 2016-03-22 |
| 9252022 | Patterning assist feature to mitigate reactive ion etch microloading effect | Daniel James Dechene, Geng Han, Scott M. Mansfield, Yunpeng Yin | 2016-02-02 |