Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9252022 | Patterning assist feature to mitigate reactive ion etch microloading effect | Geng Han, Scott M. Mansfield, Stuart A. Sieg, Yunpeng Yin | 2016-02-02 |
DD
Daniel James Dechene
Overall (2016): #428,849 of 481,213Top 90%
1
Patents 2016