Issued Patents 2016
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9478408 | Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging | Hu Kang | 2016-10-25 |
| 9460915 | Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges | Sesha Varadarajan, Shankar Swaminathan, Saangrut Sangplung, Frank L. Pasquale, Ted Minshall +2 more | 2016-10-04 |
| 9425078 | Inhibitor plasma mediated atomic layer deposition for seamless feature fill | Wei Tang, Bart J. van Schravendijk, Jun Qian, Hu Kang, Deenesh Padhi +1 more | 2016-08-23 |
| 9390909 | Soft landing nanolaminates for advanced patterning | Frank L. Pasquale, Shankar Swaminathan, Nader Shamma, Girish Dixit | 2016-07-12 |
| 9373500 | Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications | Shankar Swaminathan, Frank L. Pasquale | 2016-06-21 |
| 9355839 | Sub-saturated atomic layer deposition and conformal film deposition | Shankar Swaminathan, Hu Kang | 2016-05-31 |
| 9355886 | Conformal film deposition for gapfill | Shankar Swaminathan, Bart J. van Schravendijk, Sesha Varadarajan, Jason D. Park, Michal Danek +1 more | 2016-05-31 |
| 9343296 | Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants | — | 2016-05-17 |
| 9287113 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Jon Henri | 2016-03-15 |
| 9263350 | Multi-station plasma reactor with RF balancing | Sunil Kapoor, Karl Leeser, Yaswanth Rangineni | 2016-02-16 |
| 9257274 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann +1 more | 2016-02-09 |
| 9236244 | Sequential precursor dosing in an ALD multi-station/batch reactor | Ramesh Chandrasekharan, Damien Slevin, Karl Leeser | 2016-01-12 |
| 9230800 | Plasma activated conformal film deposition | Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh, Dennis M. Hausmann +9 more | 2016-01-05 |