Issued Patents 2005
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939435 | Plasma processing apparatus and processing method | Junichi Tanaka, Hiroyuki Kitsunai, Shoji Ikuhara, Akira Kagoshima | 2005-09-06 |
| 6939433 | Sample processing apparatus and sample processing system | Shoji Ikuhara | 2005-09-06 |
| 6923885 | Plasma processing system and apparatus and a sample processing method | Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Kazue Takahashi +1 more | 2005-08-02 |
| 6916396 | Etching system and etching method | Akira Kagoshima, Motohiko Yoshigai, Daisuke Shiraishi, Junichi Tanaka, Kenji Tamaki +1 more | 2005-07-12 |
| 6911157 | Plasma processing method and apparatus using dynamic sensing of a plasma environment | Manabu Edamura, Kazuyuki Ikenaga | 2005-06-28 |
| 6908529 | Plasma processing apparatus and method | Akira Kagoshima, Shoji Ikuhara, Daisuke Shiraishi, Junichi Tanaka | 2005-06-21 |
| 6903826 | Method and apparatus for determining endpoint of semiconductor element fabricating process | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai, Tetsunori Kaji | 2005-06-07 |
| 6899766 | Diagnosis method for semiconductor processing apparatus | Go Miya, Junichi Tanaka, Tsutomu Tetsuka | 2005-05-31 |
| 6888094 | Plasma processing method and plasma processing apparatus | Tetsuo Ono, Katsumi Setoguchi | 2005-05-03 |
| 6881352 | Disturbance-free, recipe-controlled plasma processing method | Akira Kagoshima, Shoji Ikuhara, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka +2 more | 2005-04-19 |
| 6879867 | Process monitoring device for sample processing apparatus and control method of sample processing apparatus | Junichi Tanaka, Hiroyuki Kitsunai, Shoji Ikuhara, Kazue Takahashi | 2005-04-12 |
| 6866744 | Semiconductor processing apparatus and a diagnosis method therefor | Go Miya, Junichi Tanaka, Tsutomu Tetsuka | 2005-03-15 |
| 6844275 | Heat-resistant fabric and method for production thereof | Makoto Nakahara | 2005-01-18 |
| 6841032 | Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber | Shoji Ikuhara, Junichi Tanaka | 2005-01-11 |