JT

Junichi Tanaka

HH Hitachi High-Technologies: 6 patents #2 of 157Top 2%
HI Hitachi: 4 patents #146 of 3,189Top 5%
SO Sony: 2 patents #260 of 2,039Top 15%
NS Nippon Sanso: 1 patents #1 of 8Top 15%
Overall (2005): #662 of 245,428Top 1%
12
Patents 2005

Issued Patents 2005

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6974909 IC module, and wireless information-storage medium and wireless information-transmitting/receiving apparatus including the IC module Hiroyuki Takubo, Shigenobu Abe 2005-12-13
6966346 Gas supply apparatus and gas supply method Takashi Orita, Makoto Echigojima 2005-11-22
6963028 IC module, and wireless information-storage medium and wireless information-transmitting/receiving apparatus including the IC wireless Hiroyuki Takubo, Shigenobu Abe 2005-11-08
6939435 Plasma processing apparatus and processing method Hiroyuki Kitsunai, Hideyuki Yamamoto, Shoji Ikuhara, Akira Kagoshima 2005-09-06
6916396 Etching system and etching method Akira Kagoshima, Motohiko Yoshigai, Hideyuki Yamamoto, Daisuke Shiraishi, Kenji Tamaki +1 more 2005-07-12
6908529 Plasma processing apparatus and method Hideyuki Yamamoto, Akira Kagoshima, Shoji Ikuhara, Daisuke Shiraishi 2005-06-21
6902683 Plasma processing apparatus and plasma processing method Tetsunori Kaji, Shinichi Tachi, Toru Otsubo, Katsuya Watanabe, Katsuhiko Mitani 2005-06-07
6899766 Diagnosis method for semiconductor processing apparatus Go Miya, Tsutomu Tetsuka, Hideyuki Yamamoto 2005-05-31
6881352 Disturbance-free, recipe-controlled plasma processing method Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Hiroyuki Kitsunai +2 more 2005-04-19
6879867 Process monitoring device for sample processing apparatus and control method of sample processing apparatus Hiroyuki Kitsunai, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi 2005-04-12
6866744 Semiconductor processing apparatus and a diagnosis method therefor Go Miya, Tsutomu Tetsuka, Hideyuki Yamamoto 2005-03-15
6841032 Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber Shoji Ikuhara, Hideyuki Yamamoto 2005-01-11