Issued Patents 2005
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972267 | Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor | Wei Cao, Vincent Ku, Ling Chen | 2005-12-06 |
| 6939804 | Formation of composite tungsten films | Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more | 2005-09-06 |
| 6939801 | Selective deposition of a barrier layer on a dielectric material | Ling Chen, Vincent Ku, Michael Yang, Gongda Yao | 2005-09-06 |
| 6936906 | Integration of barrier layer and seed layer | Ling Chen, Jick Yu, Mei Chang | 2005-08-30 |
| 6916398 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Alan Ouye, Norman Nakashima | 2005-07-12 |
| 6905541 | Method and apparatus of generating PDMAT precursor | Ling Chen, Vincent Ku, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2005-06-14 |
| 6855368 | Method and system for controlling the presence of fluorine in refractory metal layers | Moris Kori, Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei | 2005-02-15 |
| 6849545 | System and method to form a composite film stack utilizing sequential deposition techniques | Alfred Mak, Mei Chang, Jeong Soo Byun, Ashok Sinha, Moris Kori | 2005-02-01 |
| 6838125 | Method of film deposition using activated precursor gases | Ling Chen, Vincent Ku | 2005-01-04 |