Issued Patents 2005
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972267 | Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor | Wei Cao, Hua Chung, Ling Chen | 2005-12-06 |
| 6955211 | Method and apparatus for gas temperature control in a semiconductor processing system | Ling Chen, Dien-Yeh Wu, Alan Ouye, Irena H. Wysok | 2005-10-18 |
| 6939801 | Selective deposition of a barrier layer on a dielectric material | Hua Chung, Ling Chen, Michael Yang, Gongda Yao | 2005-09-06 |
| 6916398 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Dien-Yeh Wu, Hua Chung, Alan Ouye, Norman Nakashima | 2005-07-12 |
| 6905541 | Method and apparatus of generating PDMAT precursor | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2005-06-14 |
| 6838125 | Method of film deposition using activated precursor gases | Hua Chung, Ling Chen | 2005-01-04 |