GS

Gurtej S. Sandhu

Micron: 60 patents #4 of 831Top 1%
Applied Materials: 1 patents #371 of 884Top 45%
📍 Boise, ID: #2 of 574 inventorsTop 1%
🗺 Idaho: #3 of 1,039 inventorsTop 1%
Overall (2003): #8 of 273,478Top 1%
60
Patents 2003

Issued Patents 2003

Showing 26–50 of 60 patents

Patent #TitleCo-InventorsDate
6608343 Rough (high surface area) electrode from Ti and TiN, capacitors and semiconductor devices including same Garo Derderian 2003-08-19
6606802 Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas Michael Li, Neal R. Rueger 2003-08-19
6602785 Method of forming a conductive contact on a substrate and method of processing a semiconductor substrate using an ozone treatment Sujit Sharan, Terry L. Gilton 2003-08-05
6602796 Chemical vapor deposition for smooth metal films Garo Derderian 2003-08-05
6602807 Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off William Budge, Christopher W. Hill 2003-08-05
6596636 ALD method to improve surface coverage Garo Derderian 2003-07-22
6596583 Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers Vishnu K. Agarwal, Garo Derderian, Weimin Li, Mark Visokay, Cem Basceri +1 more 2003-07-22
6589839 Dielectric cure for reducing oxygen vacancies Cem Basceri 2003-07-08
6586285 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Cem Basceri, Irina Vasilyeva, Ammar Derraa, Philip Campbell 2003-07-01
6586820 Treatment for film surface to reduce photo footing Zhiping Yin 2003-07-01
6586796 Capacitor with high dielectric constant materials Cem Basceri, Sam Yang 2003-07-01
6583028 Methods of forming trench isolation regions Trung T. Doan 2003-06-24
6579756 DRAM processing methods Cem Basceri 2003-06-17
6573182 Chemical vapor deposition using organometallic precursors Pierre C. Fazan 2003-06-03
6573199 Methods of treating dielectric materials with oxygen, and methods of forming capacitor constructions Trung T. Doan 2003-06-03
6570252 Integrated circuitry Ravi Iyer 2003-05-27
6566147 Method for controlling deposition of dielectric films Cem Basceri, Dan Gealy 2003-05-20
6559472 Film composition Garo Derderian 2003-05-06
6555432 Integrated capacitor bottom electrode for use with conformal dielectric J. Brett Rolfson 2003-04-29
6555471 Method of making a void-free aluminum film Ravi Iyer 2003-04-29
6554910 Method for treating residues in semiconductor processing chambers Sujit Sharan 2003-04-29
6541843 Anti-reflective coatings and methods for forming and using same Zhiping Yin 2003-04-01
6541353 Atomic layer doping apparatus and method Trung T. Doan 2003-04-01
6534357 Methods for forming conductive structures and structures regarding same Cem Basceri 2003-03-18
6533894 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition Sujit Sharan, Paul Smith, Mei Chang 2003-03-18