Issued Patents 2003
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667577 | Plasma reactor with spoke antenna having a VHF mode with the spokes in phase | Steven C. Shannon, Daniel J. Hoffman, Chunshi Cui, Gerardo Delgadino, Douglas A. Buchberger, Jr. +4 more | 2003-12-23 |
| 6652712 | Inductive antenna for a plasma reactor producing reduced fluorine dissociation | Shiang-Bau Wang, Daniel J. Hoffman, Chunshi Cui, Gerardo Delgadino, David Brian McParland +3 more | 2003-11-25 |
| 6623595 | Wavy and roughened dome in plasma processing reactor | Nianci Han, Hong Shih, Li Xu | 2003-09-23 |
| 6620289 | Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system | Chun Yan, Diana Xiaobing Ma | 2003-09-16 |
| 6607634 | Reticle adapter for a reactive ion etch system | Richard W. Plavidal | 2003-08-19 |
| 6607675 | Method of etching carbon-containing silicon oxide films | Chang-Lin Hsieh, Hui Chen, Jie Yuan | 2003-08-19 |
| 6586886 | Gas distribution plate electrode for a plasma reactor | Dan Katz, Douglas A. Buchberger, Jr., Robert B. Hagen, Xiaoye Zhao, Ananda H. Kumar +3 more | 2003-07-01 |
| 6551446 | Externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2003-04-22 |
| 6547977 | Method for etching low k dielectrics | Chun Yan, Gary Hsueh, Diana Xiaobing Ma | 2003-04-15 |
| 6547978 | Method of heating a semiconductor substrate | Allen Zhao, Xiancan Deng, Diana Xiaobing Ma, Chang-Lin Hsieh | 2003-04-15 |
| 6534416 | Control of patterned etching in semiconductor features | Allen Zhao, Xiancan Deng, Diana Xiaobing Ma | 2003-03-18 |