Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6465051 | Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling | Fred C. Redeker, Romuald Nowak, Shijian Li, Timothy Dyer, Derek R. Witty | 2002-10-15 |
| 6454860 | Deposition reactor having vaporizing, mixing and cleaning capabilities | Craig Metzner, Gregory Redinbo, Pravin K. Narwankar, Patricia M. Liu | 2002-09-24 |
| 6450116 | Apparatus for exposing a substrate to plasma radicals | David B. Noble, Ravi Jallepally, Nathan D'Astici, Gary E. Miner, Guangcai Xing +1 more | 2002-09-17 |
| 6387761 | Anneal for enhancing the electrical characteristic of semiconductor devices | Wong-Cheng Shih, Pravin K. Narwankar, Randall S. Urdahl | 2002-05-14 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Yaxin Wang, Diana Chan, Tetsuya Ishikawa, Farhad Moghadam | 2002-05-07 |
| 6379466 | Temperature controlled gas distribution plate | Salvador P. Umotoy, Avi Tepman, Ronald L. Rose | 2002-04-30 |
| 6375744 | Sequential in-situ heating and deposition of halogen-doped silicon oxide | Laxman Murugesh, Maciek Orczyk, Pravin Narawankar, Jianmin Qiao | 2002-04-23 |
| 6337289 | Method and apparatus for integrating a metal nitride film in a semiconductor device | Pravin K. Narwankar | 2002-01-08 |