Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6479100 | CVD ruthenium seed for CVD ruthenium deposition | Xiaoliang Jin, Christopher Wade, Xianzhi Tao, Elaine Pao, Jun Zhao | 2002-11-12 |
| 6475854 | Method of forming metal electrodes | Pravin K. Narwankar, Annabel Nickles, Xiaoliang Jin, Deepak Upadhyaya | 2002-11-05 |
| 6440495 | Chemical vapor deposition of ruthenium films for metal electrode applications | Christopher Wade, Elaine Pao, Jun Zhao | 2002-08-27 |
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Fred C. Redeker, Tetsuya Ishikawa, Alan W. Collins | 2002-07-09 |
| 6413871 | Nitrogen treatment of polished halogen-doped silicon glass | Hichem M'Saad, Derek R. Witty, Manoj Vellaikal, Lin Zhang | 2002-07-02 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Diana Chan, Turgut Sahin, Tetsuya Ishikawa, Farhad Moghadam | 2002-05-07 |