Issued Patents 2002
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2002-12-03 |
| 6486081 | Gas distribution system for a CVD processing chamber | Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins, Lily Pang | 2002-11-26 |
| 6447651 | High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers | Kaveh Niazi, Tsutomu Tanaka, Canfeng Lai, Robert Duncan | 2002-09-10 |
| 6425276 | Water jet peening apparatus | Katsuhiko Hirano, Kunio Enomoto, Eisaku Hayashi, Sadato Shimizu, Ren Morinaka +2 more | 2002-07-30 |
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins | 2002-07-09 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Yaxin Wang, Diana Chan, Turgut Sahin, Farhad Moghadam | 2002-05-07 |
| 6363624 | Apparatus for cleaning a semiconductor process chamber | Lily Pang, Thomas Cho | 2002-04-02 |
| 6348725 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2002-02-19 |
| 6345083 | Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel | Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more | 2002-02-05 |
| 6341151 | Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel | Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more | 2002-01-22 |