Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486081 | Gas distribution system for a CVD processing chamber | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins | 2002-11-26 |
| 6450117 | Directing a flow of gas in a substrate processing chamber | Laxman Murugesh, Padmanaban Krishnaraj, Michael S. Cox, Canfeng Lai, Narendra Dubey +2 more | 2002-09-17 |
| 6363624 | Apparatus for cleaning a semiconductor process chamber | Thomas Cho, Tetsuya Ishikawa | 2002-04-02 |
| 6364958 | Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges | Canfeng Lai, Michael S. Cox, Michael Barnes | 2002-04-02 |