Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486081 | Gas distribution system for a CVD processing chamber | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Lily Pang | 2002-11-26 |
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2002-07-09 |