Issued Patents 2002
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6391766 | Method of making a slot via filled dual damascene structure with middle stop layer | Lynne A. Okada, Ramkumar Subramanian, Calvin T. Gabriel | 2002-05-21 |
| 6383919 | Method of making a dual damascene structure without middle stop layer | Lynne A. Okada, Ramkumar Subramanian, Calvin T. Gabriel | 2002-05-07 |
| 6380091 | Dual damascene arrangement for metal interconnection with oxide dielectric layer and low K dielectric constant layer | Jerry Cheng, Darrell M. Erb | 2002-04-30 |
| 6376389 | Method for eliminating anti-reflective coating in semiconductors | Ramkumar Subramanian, Minh Van Ngo, Kashmir Sahota, YongZhong Hu, Hiroyuki Kinoshita +1 more | 2002-04-23 |
| 6376308 | Process for fabricating an EEPROM device having a pocket substrate region | David K. Foote, Bharath Rangarajan, George J. Kluth | 2002-04-23 |
| 6372635 | Method for making a slot via filled dual damascene low k interconnect structure without middle stop layer | Lynne A. Okada, Ramkumar Subramanian, Calvin T. Gabriel | 2002-04-16 |
| 6372631 | Method of making a via filled dual damascene structure without middle stop layer | Lynne A. Okada, Ramkumar Subramanian, Calvin T. Gabriel | 2002-04-16 |
| 6365505 | Method of making a slot via filled dual damascene structure with middle stop layer | Lynne A. Okada, Ramkumar Subramanian, Calvin T. Gabriel | 2002-04-02 |
| 6362052 | Use of an etch to reduce the thickness and around the edges of a resist mask during the creation of a memory cell | Bharath Rangarajan, George J. Kluth, Ursula Q. Quinto | 2002-03-26 |
| 6358362 | Methods and arrangements for determining an endpoint for an in-situ local interconnect etching process | William G. En, Allison Holbrook | 2002-03-19 |
| 6359307 | Method for forming self-aligned contacts and interconnection lines using dual damascene techniques | Hiroyuki Kinoshita, Kashmir Sahota, Yu Sun, Wenge Yang | 2002-03-19 |
| 6355575 | Semiconductor device and method of manufacturing without damaging HSQ layer and metal pattern | Simon S. Chan, Susan H. Chen | 2002-03-12 |
| 6348406 | Method for using a low dielectric constant layer as a semiconductor anti-reflective coating | Ramkumar Subramanian, Minh Van Ngo, Kashmir Sahota, YongZhong Hu, Hiroyuki Kinoshita +1 more | 2002-02-19 |
| 6348379 | Method of forming self-aligned contacts using consumable spacers | Ramkumar Subramanian, Yu Sun | 2002-02-19 |