Issued Patents All Time
Showing 26–50 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9890233 | Resist composition, method of forming resist pattern, and polymeric compound | Miki Shinomiya, Kotaro Endo, Yuta Iwasawa | 2018-02-13 |
| 9862695 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | Hiroshi Koyama, Masamichi Nishimura, Naoki Yamashita, Yoshitaka Komuro, Yoshiyuki Utsumi | 2018-01-09 |
| 9846364 | Method of forming resist pattern | Junichi Tsuchiya, Takayoshi Mori | 2017-12-19 |
| 9819846 | Solid-state imaging device having a moth-eye structure and light blocking portions, method for manufacturing the same, and electronic apparatus | Yoshiaki Masuda, Yuki Miyanami, Hideshi Abe, Masanari Yamaguchi, Yoshiki Ebiko +2 more | 2017-11-14 |
| 9696625 | Method of forming resist pattern | Junichi Tsuchiya, Rikita Tsunoda, Tomonari SUNAMICHI, Takayoshi Mori | 2017-07-04 |
| 9469712 | Method of producing polymeric compound, resist composition and method of forming resist pattern | Yoshiyuki Utsumi, Junichi Tsuchiya, Yoichi Hori | 2016-10-18 |
| 9341947 | Resist composition and method of forming resist pattern | Yoshitaka Komuro, Naoki Yamashita | 2016-05-17 |
| 9250531 | Method of forming resist pattern and negative tone-development resist composition | Daichi Takaki, Daiju Shiono, Kenri Konno, Isamu Takagi | 2016-02-02 |
| 9235123 | Resist composition and resist pattern forming method | Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Yoshitaka Komuro, Masatoshi Arai | 2016-01-12 |
| 9164379 | Resist composition, method for forming resist pattern, and compound | Yoshiyuki Utsumi, Yoshitaka Komuro | 2015-10-20 |
| 9023580 | Method of forming polymeric compound, resist composition and method of forming resist pattern | Daiju Shiono, Takahiro Dazai | 2015-05-05 |
| 8980524 | Positive resist composition and method of forming resist pattern | Daiju Shiono, Masatoshi Arai | 2015-03-17 |
| 8952315 | Solid-state imaging device having a vertical transistor with a dual polysilicon gate | Kazunobu Ohta | 2015-02-10 |
| 8937363 | Solid-state imaging device and electronic apparatus | Masashi Nakazawa | 2015-01-20 |
| 8927191 | Resist composition, method of forming resist pattern and polymeric compound | Junichi Tsuchiya, Daichi Takaki, Masatoshi Arai, Daiju Shiono | 2015-01-06 |
| 8916332 | Resist composition, method of forming resist pattern, and polymeric compound | Makiko Irie, Daichi Takaki | 2014-12-23 |
| 8911928 | Resist composition, method of forming resist pattern, polymeric compound and method of producing the same | Daiju Shiono, Daichi Takaki, Junichi Tsuchiya | 2014-12-16 |
| 8866251 | Solid-state imaging element having optical waveguide with insulating layer | — | 2014-10-21 |
| 8846838 | Fluorine-containing block copolymeric compound | Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai | 2014-09-30 |
| 8795947 | Resist composition and method of forming resist pattern | Makiko Irie, Kotaro Endo, Tsuyoshi Kurosawa | 2014-08-05 |
| 8742038 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Daiju Shiono, Takahiro Dazai, Sanae Furuya, Takayoshi Mori | 2014-06-03 |
| 8735045 | Positive resist composition, method of forming resist pattern, and polymeric compound | Daiju Shiono, Daichi Takaki | 2014-05-27 |
| 8658343 | Resist composition, and method of forming resist pattern | Masatoshi Arai, Junichi Tsuchiya, Daiju Shiono, Daichi Takaki | 2014-02-25 |
| 8648165 | Polycarbonate resin composition | Atsushi SUMITA, Daisuke Takahashi, Fumihiro Togashi | 2014-02-11 |
| 8642244 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Daiju Shiono, Takahiro Dazai, Sanae Furuya, Takayoshi Mori | 2014-02-04 |