Issued Patents All Time
Showing 51–75 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8632960 | Method of forming resist pattern and negative tone-development resist composition | Takahiro Dazai, Daiju Shiono, Sho Abe | 2014-01-21 |
| 8609320 | Resist composition, method of forming resist pattern, polymeric compound and compound | Yoshiyuki Utsumi, Takehiro Seshimo, Daichi Takaki, Junichi Tsuchiya | 2013-12-17 |
| 8586288 | Method of forming resist pattern | Daiju Shiono | 2013-11-19 |
| 8574941 | Method for manufacturing solid-state imaging device | Susumu Hiyama | 2013-11-05 |
| 8541529 | Positive resist composition, method of forming resist pattern, and polymeric compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya | 2013-09-24 |
| 8487056 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai, Kotaro Endo | 2013-07-16 |
| 8475997 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | Daiju Shiono, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more | 2013-07-02 |
| 8450044 | Positive resist composition and method of forming resist pattern | Daiju Shiono, Daichi Takaki | 2013-05-28 |
| 8440385 | Positive resist composition, method of forming resist pattern and polymeric compound | Daiju Shiono, Masatoshi Arai | 2013-05-14 |
| 8409360 | Cleaning method for a process of liquid immersion lithography | Jun Koshiyama, Jiro Yokoya, Hiromitsu Tsuji | 2013-04-02 |
| 8404428 | Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound | Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai | 2013-03-26 |
| 8404426 | Negative resist composition, method of forming resist pattern and polymeric compound | Sho Abe, Daiju Shiono, Takahiro Dazai | 2013-03-26 |
| 8394578 | Method of forming resist pattern and negative tone-development resist composition | Takahiro Dazai, Daiju Shiono | 2013-03-12 |
| 8367296 | Positive resist composition, method of forming resist pattern, and polymeric compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya | 2013-02-05 |
| 8367503 | Semiconductor device and a method of manufacturing the same | Junli Wang, Toyotaka Kataoka, Yoshiya Hagimoto | 2013-02-05 |
| 8329378 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai | 2012-12-11 |
| 8268529 | Positive resist composition, method of forming resist pattern using the same, and polymeric compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya, Masaru Takeshita | 2012-09-18 |
| 8236477 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai, Kotaro Endo | 2012-08-07 |
| 8232041 | Positive resist composition, method of forming resist pattern, and polymeric compound | Takahiro Dazai, Tasuku Matsumiya, Daiju Shiono | 2012-07-31 |
| 8227170 | Resist composition, method of forming resist pattern, polymeric compound, and compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori +1 more | 2012-07-24 |
| 8221956 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound | Daiju Shiono, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more | 2012-07-17 |
| 8206891 | Positive resist composition and method of forming resist pattern | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Takahiro Dazai, Fumitake Kaneko +1 more | 2012-06-26 |
| 8192915 | Positive resist composition, method of forming resist pattern, and polymeric compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya | 2012-06-05 |
| 8182976 | Positive resist composition, method of forming resist pattern, and polymeric compound | Takahiro Dazai, Daiju Shiono, Tasuku Matsumiya | 2012-05-22 |
| 8088553 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Takayoshi Mori, Sanae Furuya, Daiju Shiono +1 more | 2012-01-03 |