Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9862695 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | Hiroshi Koyama, Naoki Yamashita, Yoshitaka Komuro, Tomoyuki Hirano, Yoshiyuki Utsumi | 2018-01-09 |
| 9261785 | Polymer compound, resin composition for photoresists, and method for producing semiconductor | Akira Eguchi, Mitsuru Ohno | 2016-02-16 |
| 8753793 | Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method | Akira Eguchi | 2014-06-17 |
| 8236971 | Polycyclic ester containing cyano group and lactone skeleton | Keizo Inoue, Takahiro Iwahama, Kiyoharu Tsutsumi | 2012-08-07 |
| 7834114 | Polycyclic ester containing cyano group and lactone skeleton | Keizo Inoue, Takahiro Iwahama, Kiyoharu Tsutsumi | 2010-11-16 |
| 7750101 | Polycyclic ester containing cyano group and lactone skeleton | Keizo Inoue, Takahiro Iwahama, Kiyoharu Tsutsumi | 2010-07-06 |
| 7033726 | Photoresist polymeric compound and photoresist resin composition | Hiroshi Koyama, Kiyoharu Tsutsumi | 2006-04-25 |