Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7829158 | Method for depositing a barrier layer on a low dielectric constant material | — | 2010-11-09 |
| 7799681 | Method for forming a ruthenium metal cap layer | Kenji Suzuki, Frank M. Cerio, Jr., Miho Jomen, Shigeru Mizuno, Yasushi Mizusawa | 2010-09-21 |
| 7772111 | Substrate processing method and fabrication process of a semiconductor device | Taro Ikeda, Masamichi Hara | 2010-08-10 |
| 7727912 | Method of light enhanced atomic layer deposition | Frank M. Cerio, Jr., Jacques Faguet | 2010-06-01 |
| 7727883 | Method of forming a diffusion barrier and adhesion layer for an interconnect structure | Shigeru Mizuno | 2010-06-01 |
| 7717061 | Gas switching mechanism for plasma processing apparatus | Naoki Yoshii, Kohei Kawamura, Yukio Fukuda, Takashi Shigeoka, Yasuhiko Kojima +3 more | 2010-05-18 |
| 7718527 | Method for forming cobalt tungsten cap layers | Shigeru Mizuno, Miho Jomen | 2010-05-18 |
| 7708835 | Film precursor tray for use in a film precursor evaporation system and method of using | Kenji Suzuki, Emmanuel Guidotti, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa | 2010-05-04 |
| 7651568 | Plasma enhanced atomic layer deposition system | Tsukasa Matsuda, Frank M. Cerio, Jr., Kaoru Yamamoto | 2010-01-26 |
| 7645484 | Method of forming a metal carbide or metal carbonitride film having improved adhesion | — | 2010-01-12 |
| 7592257 | Semiconductor contact structure containing an oxidation-resistant diffusion barrier and method of forming | — | 2009-09-22 |
| 7491430 | Deposition method for forming a film including metal, nitrogen and carbon | Atsushi Gomi, Tatsuo Hatano | 2009-02-17 |
| 7422636 | Plasma enhanced atomic layer deposition system having reduced contamination | — | 2008-09-09 |
| 7407876 | Method of plasma enhanced atomic layer deposition of TaC and TaCN films having good adhesion to copper | — | 2008-08-05 |
| 7338901 | Method of preparing a film layer-by-layer using plasma enhanced atomic layer deposition | — | 2008-03-04 |
| 7332426 | Substrate processing method and fabrication process of a semiconductor device | Taro Ikeda, Masamichi Hara | 2008-02-19 |
| 7314835 | Plasma enhanced atomic layer deposition system and method | Kaoru Yamamoto | 2008-01-01 |
| 6991684 | Heat-treating apparatus and heat-treating method | Hiroshi Kannan, Noboru Tamura, Yasuhiko Kojima | 2006-01-31 |