Issued Patents All Time
Showing 51–75 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9059038 | System for in-situ film stack measurement during etching and etch control method | Junwei Bao, Hanyou Chu, Wen Jin, Ching-Ling Meng, Weiwen Xu +4 more | 2015-06-16 |
| 8980651 | Overlay measurement for a double patterning | Hongyu Yue | 2015-03-17 |
| 8838422 | Process control using ray tracing-based libraries and machine learning systems | Manuel Madriaga | 2014-09-16 |
| 8812277 | Method of enhancing an optical metrology system using ray tracing and flexible ray libraries | — | 2014-08-19 |
| 8570531 | Method of regenerating diffraction signals for optical metrology systems | — | 2013-10-29 |
| 8289527 | Optimization of ray tracing and beam propagation parameters | Manuel Madriaga | 2012-10-16 |
| 8069020 | Generating simulated diffraction signal using a dispersion function relating process parameter to dispersion | Hanyou Chu | 2011-11-29 |
| 7990534 | System and method for azimuth angle calibration | — | 2011-08-02 |
| 7961306 | Optimizing sensitivity of optical metrology measurements | Adam E. Norton, Manuel Madriaga | 2011-06-14 |
| 7949490 | Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology | Wei Liu, Weidong Yang | 2011-05-24 |
| 7940391 | Pre-aligned metrology system and modules | — | 2011-05-10 |
| 7912679 | Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersion | Hanyou Chu | 2011-03-22 |
| 7742177 | Noise-reduction metrology models | Yu Liu | 2010-06-22 |
| 7742163 | Field replaceable units (FRUs) optimized for integrated metrology (IM) | — | 2010-06-22 |
| 7729873 | Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology | Wei Liu, Weidung Yang | 2010-06-01 |
| 7702471 | Determining one or more profile parameters of a photomask covered by a pellicle | Sanjay K. Yedur | 2010-04-20 |
| 7639375 | Determining transmittance of a photomask using optical metrology | Sanjay K. Yedur, Youxian Wen, Wei Liu, Hanyou Chu, Ying Ying Luo | 2009-12-29 |
| 7639351 | Automated process control using optical metrology with a photonic nanojet | Zhigang Chen, Hanyou Chu, Manuel Madriaga | 2009-12-29 |
| 7636649 | Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion | Hanyou Chu, Manuel Madriaga | 2009-12-22 |
| 7627392 | Automated process control using parameters determined with approximation and fine diffraction models | Wei Liu, Weidung Yang, Manuel Madriaga | 2009-12-01 |
| 7617075 | Library accuracy enhancment and evaluation | Junwei Bao, Wei Liu | 2009-11-10 |
| 7588949 | Optical metrology model optimization based on goals | Vi Vuong, Emmanuel Drege, Junwei Bao | 2009-09-15 |
| 7567352 | Controlling a fabrication tool using support vector machine | Wen Jin, Junwei Bao, Manuel Madriaga | 2009-07-28 |
| 7523021 | Weighting function to enhance measured diffraction signals in optical metrology | Vi Vuong, Junwei Bao, Yan Chen | 2009-04-21 |
| 7523439 | Determining position accuracy of double exposure lithography using optical metrology | Youxian Wen | 2009-04-21 |