RN

Ryo Nonaka

TL Tokyo Electron Limited: 11 patents #663 of 5,567Top 15%
EN Enplas: 3 patents #87 of 255Top 35%
TL Tokyo Electron Yamanashi Limited: 2 patents #21 of 138Top 20%
MI Mitsuba: 1 patents #291 of 618Top 50%
📍 Rifu, JP: #197 of 2,101 inventorsTop 10%
Overall (All Time): #290,790 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
11578639 Fan shroud and blower device Hidetake Ota 2023-02-14
11022842 Planar light source device and display device Kyouhei Yamada 2021-06-01
10418258 Mounting table temperature control device and substrate processing apparatus 2019-09-17
10408417 Light-emitting device with light flux control member having prismatic elements on bottom surface forming acute angle with side edge of light source Yasuyuki Fukuda 2019-09-10
D778334 Lens for light emitting diode Hiroshi Takatori, Yasuyuki Fukuda 2017-02-07
9330891 Plasma processing method and plasma processing apparatus Masanori Sato, Natsuki Yabumoto, Takamitsu TAKAYAMA, Akitoshi Harada, Junichi Sasaki +1 more 2016-05-03
8950469 Temperature control system and temperature control method for substrate mounting table Yasuharu Sasaki, Nobuyuki Nagayama 2015-02-10
8132580 Substrate processing system and substrate cleaning apparatus including a jetting apparatus Tsuyoshi Moriya, Tadashi Onishi, Eiichi Nishimura 2012-03-13
7988062 Temperature control device for target substrate, temperature control method and plasma processing apparatus including same Koichi Murakami 2011-08-02
7230202 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod Daisuke Hayashi, Kazuya Nagaseki, Shinji Himori, Atsushi Matsuura 2007-06-12
7005660 Surface processing apparatus Minoru Honda, Kazuyuki Mitsuoka 2006-02-28
6492612 Plasma apparatus and lower electrode thereof Chihiro Taguchi 2002-12-10
6074518 Plasma processing apparatus Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara, Hiroshi Tsuchiya, Masayuki Tomoyasu +6 more 2000-06-13
5997962 Plasma process utilizing an electrostatic chuck Masahiro Ogasawara, Yoshiyuki Kobayashi 1999-12-07
5914568 Plasma processing apparatus 1999-06-22
5310453 Plasma process method using an electrostatic chuck Kazuo Fukasawa, Kousuke Imafuku 1994-05-10