Issued Patents All Time
Showing 76–92 of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7638759 | Hyperthermal neutral beam source and method of operating | Demetre J. Economou, Vincent M. Donnelly | 2009-12-29 |
| 7584714 | Method and system for improving coupling between a surface wave plasma source and a plasma space | Caiz Hong Tian, Naoki Matsumoto | 2009-09-08 |
| 7572386 | Method of treating a mask layer prior to performing an etching process | Peter L. G. Ventzek, Akira Koshiishi, Ikuo Sawada | 2009-08-11 |
| 7553427 | Plasma etching of Cu-containing layers | Audunn Ludviksson | 2009-06-30 |
| 7449414 | Method of treating a mask layer prior to performing an etching process | Peter L. G. Ventzek, Akira Koshiishi, Ikuo Sawada | 2008-11-11 |
| 7396431 | Plasma processing system for treating a substrate | Hiromitsu Kambara, Caizhong Tian, Tetsuya Nishizuka, Toshihisa Nozawa | 2008-07-08 |
| 7361608 | Method and system for forming a feature in a high-k layer | Akiteru Ko, Annie Xia | 2008-04-22 |
| 7358484 | Hyperthermal neutral beam source and method of operating | Demetre J. Economou, Vincent M. Donnelly | 2008-04-15 |
| 7268084 | Method for treating a substrate | Hitomitsu Kambara, Caiz Hong Tian, Tetsuya Nishizuka, Toshihisa Nozawa | 2007-09-11 |
| 7229563 | Plasma etching of Ni-containing materials | — | 2007-06-12 |
| 7214327 | Anisotropic dry etching of Cu-containing layers | Audunn Ludviksson | 2007-05-08 |
| 7202169 | Method and system for etching high-k dielectric materials | Audunn Ludviksson | 2007-04-10 |
| 7138767 | Surface wave plasma processing system and method of using | Caiz Hong Tian, Naoki Matsumoto | 2006-11-21 |
| 6852584 | Method of trimming a gate electrode structure | Hongyu Yue, Hiromitsu Kambara | 2005-02-08 |
| 6809310 | Accelerated ion beam generator | — | 2004-10-26 |
| 6512333 | RF-powered plasma accelerator/homogenizer | — | 2003-01-28 |
| D437036 | Parabolic electric heater | — | 2001-01-30 |