Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5262610 | Low particulate reliability enhanced remote microwave plasma discharge device | Steve S. Huang, Cecil J. Davis, Lee M. Loewenstein | 1993-11-16 |
| 5248636 | Processing method using both a remotely generated plasma and an in-situ plasma with UV irradiation | Cecil J. Davis, Joseph D. Luttmer, Rudy L. York, Lee M. Loewenstein, Robert T. Matthews +1 more | 1993-09-28 |
| 5138973 | Wafer processing apparatus having independently controllable energy sources | Cecil J. Davis, Joseph D. Luttmer, Rudy L. York, Lee M. Loewenstein, Robert T. Matthews +1 more | 1992-08-18 |
| 4997520 | Method for etching tungsten | Cecil J. Davis, Duane E. Carter, Jeff D. Achenbach | 1991-03-05 |
| 4988644 | Method for etching semiconductor materials using a remote plasma generator | Cecil J. Davis, Steve S. Huang, Lee M. Loewenstein, Jeff D. Achenbach | 1991-01-29 |
| 4923562 | Processing of etching refractory metals | Cecil J. Davis | 1990-05-08 |
| 4915777 | Method for etching tungsten | Monte A. Douglas, Cecil J. Davis | 1990-04-10 |
| 4911103 | Processing apparatus and method | Cecil J. Davis, Dean W. Freeman, Robert T. Matthews, Joel T. Tomlin | 1990-03-27 |
| 4891488 | Processing apparatus and method | Cecil J. Davis | 1990-01-02 |
| 4891087 | Isolation substrate ring for plasma reactor | Cecil J. Davis, John E. Spencer, Thomas D. Bonifield, William J. Stiltz, Randall E. Johnson +2 more | 1990-01-02 |
| 4886570 | Processing apparatus and method | Cecil J. Davis, Robert T. Matthews, Lee M. Loewenstein, Randall C. Hildenbrand, John I. Jones | 1989-12-12 |
| 4878994 | Method for etching titanium nitride local interconnects | Cecil J. Davis, Tom Tang, Lee M. Loewenstein | 1989-11-07 |
| 4874723 | Selective etching of tungsten by remote and in situ plasma generation | Duane E. Carter, Cecil J. Davis, Sue Crank | 1989-10-17 |
| 4867841 | Method for etch of polysilicon film | Lee M. Loewenstein, Cecil J. Davis | 1989-09-19 |
| 4863558 | Method for etching tungsten | Cecil J. Davis, Sue Crank | 1989-09-05 |
| 4855016 | Method for etching aluminum film doped with copper | Cecil J. Davis, Lee M. Loewenstein | 1989-08-08 |
| 4849067 | Method for etching tungsten | Cecil J. Davis, Duane E. Carter, Sue Crank, John I. Jones | 1989-07-18 |
| 4849068 | Apparatus and method for plasma-assisted etching | Cecil J. Davis, Duane E. Carter | 1989-07-18 |
| 4842676 | Process for etch of tungsten | Cecil J. Davis, Lee M. Loewenstein | 1989-06-27 |
| 4842686 | Wafer processing apparatus and method | Cecil J. Davis, Lee M. Loewenstein, Robert T. Matthews, John I. Jones | 1989-06-27 |
| 4842687 | Method for etching tungsten | Cecil J. Davis | 1989-06-27 |
| 4838990 | Method for plasma etching tungsten | Cecil J. Davis, John I. Jones | 1989-06-13 |
| 4838984 | Method for etching films of mercury-cadmium-telluride and zinc sulfid | Joseph D. Luttmer, Cecil J. Davis, Patricia B. Smith, Rudy L. York, Lee M. Loewenstein | 1989-06-13 |
| 4828649 | Method for etching an aluminum film doped with silicon | Cecil J. Davis, Lee M. Loewenstein | 1989-05-09 |
| 4822450 | Processing apparatus and method | Cecil J. Davis, Lee M. Loewenstein, Robert T. Matthews, Randall C. Hildenbrand, Dean W. Freeman +1 more | 1989-04-18 |