| 6685073 |
Method and apparatus for stretching and processing saw film tape after breaking a partially sawn wafer |
Robert G. McKenna, David Durin, Don Reed Brown, Cecil J. Davis |
2004-02-03 |
| 5464499 |
Multi-electrode plasma processing apparatus |
Mehrdad M. Moslehi, Cecil J. Davis, Robert T. Matthews |
1995-11-07 |
| 5286297 |
Multi-electrode plasma processing apparatus |
Mehrdad M. Moslehi, Cecil J. Davis, Robert T. Matthews |
1994-02-15 |
| 4891087 |
Isolation substrate ring for plasma reactor |
Cecil J. Davis, John E. Spencer, Thomas D. Bonifield, Rhett B. Jucha, William J. Stiltz +2 more |
1990-01-02 |
| 4886570 |
Processing apparatus and method |
Cecil J. Davis, Robert T. Matthews, Lee M. Loewenstein, Rhett B. Jucha, Randall C. Hildenbrand |
1989-12-12 |
| 4872938 |
Processing apparatus |
Cecil J. Davis, Joseph V. Abernathy, Robert T. Matthews, Randall C. Hildenbrand, Bruce Simpson +2 more |
1989-10-10 |
| 4849067 |
Method for etching tungsten |
Rhett B. Jucha, Cecil J. Davis, Duane E. Carter, Sue Crank |
1989-07-18 |
| 4842686 |
Wafer processing apparatus and method |
Cecil J. Davis, Lee M. Loewenstein, Robert T. Matthews, Rhett B. Jucha |
1989-06-27 |
| 4838990 |
Method for plasma etching tungsten |
Rhett B. Jucha, Cecil J. Davis |
1989-06-13 |
| 4836905 |
Processing apparatus |
Cecil J. Davis, Joseph V. Abernathy, Robert T. Matthews, Randall C. Hildenbrand, Bruce Simpson +2 more |
1989-06-06 |
| 4822450 |
Processing apparatus and method |
Cecil J. Davis, Lee M. Loewenstein, Rhett B. Jucha, Robert T. Matthews, Randall C. Hildenbrand +1 more |
1989-04-18 |
| 4695700 |
Dual detector system for determining endpoint of plasma etch process |
John D. Provence, Frederick W. Brown |
1987-09-22 |
| 4657618 |
Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate |
John E. Spencer, Randall E. Johnson, Dan Hockersmith, Randall C. Hildenbrand, William S. Jaspersen |
1987-04-14 |