| 6967054 |
Coating thickness control using surface features |
Jay B. Kirk, Zuhair Hilali, Duy Phan, Darren Stephen Lee, Gary A. Evans +1 more |
2005-11-22 |
|
| 6544886 |
Process for isolating an exposed conducting surface |
Jiong-Ping Lu, Qi-Zhong Hong, Yung Liu |
2003-04-08 |
$16,265,000 |
| 6423627 |
Method for forming memory array and periphery contacts using a same mask |
Ming-Jang Hwang |
2002-07-23 |
$26,143,000 |
| 6282010 |
Anti-reflective coatings for spatial light modulators |
Frank C. Sulzbach, Brian L. Ray, G. Sreenivas, Henry W. Trombley, Austin L. Huang +1 more |
2001-08-28 |
$65,117,000 |
| 6271078 |
Simplifying conductive plate/via isolation |
Stephen W. Russell, Antonio L. P. Rotondaro, Donald L. Plumton |
2001-08-07 |
$77,130,000 |
| 6184129 |
Low resistivity poly-silicon gate produced by selective metal growth |
Ming-Jang Hwang, Jiong-Ping Lu, Wei-Yung Hsu |
2001-02-06 |
$64,248,000 |
| 6100188 |
Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing |
Jiong-Ping Lu, Ming-Jang Hwang, Dick N. Anderson, Wei-Yung Hsu |
2000-08-08 |
$71,555,000 |
| 6028690 |
Reduced micromirror mirror gaps for improved contrast ratio |
James D. Huffman, Rodney D. Miller, Brian L. Ray, Robert Meier |
2000-02-22 |
$71,303,000 |
| 5835336 |
Complemetary reset scheme for micromechanical devices |
Richard L. Knipe, Lionel S. White, Jr. |
1998-11-10 |
$19,773,000 |
| 5512130 |
Method and apparatus of etching a clean trench in a semiconductor material |
Gabriel G. Barna, James G. Frank, Richard P. VanMeurs |
1996-04-30 |
$9,601,000 |
| 5252506 |
Method to eliminate gate filaments on field plate isolated devices |
William R. McKee, Gishi Chung, Fred Fishburn |
1993-10-12 |
$7,138,000 |
| 4997520 |
Method for etching tungsten |
Rhett B. Jucha, Cecil J. Davis, Jeff D. Achenbach |
1991-03-05 |
$5,116,000 |
| 4945069 |
Organic space holder for trench processing |
— |
1990-07-31 |
$10,017,000 |
| 4874723 |
Selective etching of tungsten by remote and in situ plasma generation |
Rhett B. Jucha, Cecil J. Davis, Sue Crank |
1989-10-17 |
$1,450,000 |
| 4849068 |
Apparatus and method for plasma-assisted etching |
Cecil J. Davis, Rhett B. Jucha |
1989-07-18 |
$2,231,000 |
| 4849067 |
Method for etching tungsten |
Rhett B. Jucha, Cecil J. Davis, Sue Crank, John I. Jones |
1989-07-18 |
$2,231,000 |
| 4842680 |
Advanced vacuum processor |
Cecil J. Davis, Timothy J. Wooldridge |
1989-06-27 |
$1,908,000 |
| 4685999 |
Apparatus for plasma assisted etching |
Cecil J. Davis, Rhett B. Jucha |
1987-08-11 |
$4,249,000 |
| 4623417 |
Magnetron plasma reactor |
John E. Spencer, Dave Autery |
1986-11-18 |
$2,573,000 |
| 4502915 |
Two-step plasma process for selective anisotropic etching of polycrystalline silicon without leaving residue |
Rhett B. Jucha |
1985-03-05 |
$1,225,000 |