Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6967054 | Coating thickness control using surface features | Jay B. Kirk, Zuhair Hilali, Duy Phan, Darren Stephen Lee, Gary A. Evans +1 more | 2005-11-22 |
| 6544886 | Process for isolating an exposed conducting surface | Jiong-Ping Lu, Qi-Zhong Hong, Yung Liu | 2003-04-08 |
| 6423627 | Method for forming memory array and periphery contacts using a same mask | Ming-Jang Hwang | 2002-07-23 |
| 6282010 | Anti-reflective coatings for spatial light modulators | Frank C. Sulzbach, Brian L. Ray, G. Sreenivas, Henry W. Trombley, Austin L. Huang +1 more | 2001-08-28 |
| 6271078 | Simplifying conductive plate/via isolation | Stephen W. Russell, Antonio L. P. Rotondaro, Donald L. Plumton | 2001-08-07 |
| 6184129 | Low resistivity poly-silicon gate produced by selective metal growth | Ming-Jang Hwang, Jiong-Ping Lu, Wei-Yung Hsu | 2001-02-06 |
| 6100188 | Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing | Jiong-Ping Lu, Ming-Jang Hwang, Dick N. Anderson, Wei-Yung Hsu | 2000-08-08 |
| 6028690 | Reduced micromirror mirror gaps for improved contrast ratio | James D. Huffman, Rodney D. Miller, Brian L. Ray, Robert Meier | 2000-02-22 |
| 5835336 | Complemetary reset scheme for micromechanical devices | Richard L. Knipe, Lionel S. White, Jr. | 1998-11-10 |
| 5512130 | Method and apparatus of etching a clean trench in a semiconductor material | Gabriel G. Barna, James G. Frank, Richard P. VanMeurs | 1996-04-30 |
| 5252506 | Method to eliminate gate filaments on field plate isolated devices | William R. McKee, Gishi Chung, Fred Fishburn | 1993-10-12 |
| 4997520 | Method for etching tungsten | Rhett B. Jucha, Cecil J. Davis, Jeff D. Achenbach | 1991-03-05 |
| 4945069 | Organic space holder for trench processing | — | 1990-07-31 |
| 4874723 | Selective etching of tungsten by remote and in situ plasma generation | Rhett B. Jucha, Cecil J. Davis, Sue Crank | 1989-10-17 |
| 4849068 | Apparatus and method for plasma-assisted etching | Cecil J. Davis, Rhett B. Jucha | 1989-07-18 |
| 4849067 | Method for etching tungsten | Rhett B. Jucha, Cecil J. Davis, Sue Crank, John I. Jones | 1989-07-18 |
| 4842680 | Advanced vacuum processor | Cecil J. Davis, Timothy J. Wooldridge | 1989-06-27 |
| 4685999 | Apparatus for plasma assisted etching | Cecil J. Davis, Rhett B. Jucha | 1987-08-11 |
| 4623417 | Magnetron plasma reactor | John E. Spencer, Dave Autery | 1986-11-18 |
| 4502915 | Two-step plasma process for selective anisotropic etching of polycrystalline silicon without leaving residue | Rhett B. Jucha | 1985-03-05 |