Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7906441 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Haowen Bu, Hiroaki Niimi | 2011-03-15 |
| 7858459 | Work function adjustment with the implant of lanthanides | Manfred Ramin, Michael F. Pas | 2010-12-28 |
| 7807522 | Lanthanide series metal implant to control work function of metal gate electrodes | Manfred Ramin, Michael F. Pas | 2010-10-05 |
| 7799669 | Method of forming a high-k gate dielectric layer | Manfred Ramin, Michael F. Pas | 2010-09-21 |
| 7682988 | Thermal treatment of nitrided oxide to improve negative bias thermal instability | Rajesh Khamankar, Ajith Varghese, Cathy Chancellor, Anand Krishnan, Malcolm J. Bevan | 2010-03-23 |
| 7582521 | Dual metal gates for mugfet device | Weize Xiong | 2009-09-01 |
| 7514308 | CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers | Ajith Varghese, Rajesh Khamankar | 2009-04-07 |
| 7402524 | Post high voltage gate oxide pattern high-vacuum outgas surface treatment | Brian K. Kirkpatrick, Rajesh Khamankar, Malcolm J. Bevan, April Gurba, Clinton L. Montgomery +1 more | 2008-07-22 |
| 7345001 | Gate dielectric having a flat nitrogen profile and method of manufacture therefor | Hiroaki Niimi, Rajesh Khamankar, Toan Tran | 2008-03-18 |
| 7339240 | Dual-gate integrated circuit semiconductor device | Brian K. Kirkpatrick, Rajesh Khamankar, Malcolm J. Bevan, April Gurba, Clinton L. Montgomery +1 more | 2008-03-04 |
| 7332433 | Methods of modulating the work functions of film layers | Kisik Choi, Prashant Majhi | 2008-02-19 |
| 7226826 | Semiconductor device having multiple work functions and method of manufacture therefor | Mark Visokay, Antonio Luis Pacheco Rotondaro, Luigi Colombo | 2007-06-05 |
| 7227201 | CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers | Ajith Varghese, Rajesh Khamankar | 2007-06-05 |
| 7087440 | Monitoring of nitrided oxide gate dielectrics by determination of a wet etch | April Gurba, Hiroaki Niimi | 2006-08-08 |
| 7049242 | Post high voltage gate dielectric pattern plasma surface treatment | Brian K. Kirkpatrick, Rajesh Khamankar, Malcolm J. Bevan, April Gurba, Clinton L. Montgomery +1 more | 2006-05-23 |
| 7018925 | Post high voltage gate oxide pattern high-vacuum outgas surface treatment | Brian K. Kirkpatrick, Rajesh Khamankar, Malcolm J. Bevan, April Gurba, Clinton L. Montgomery +1 more | 2006-03-28 |
| 6924239 | Method for removal of hydrocarbon contamination on gate oxide prior to non-thermal nitridation using “spike” radical oxidation | Hiroaki Niimi, Ajith Varghese | 2005-08-02 |
| 6921703 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Haowen Bu, Hiroaki Niimi | 2005-07-26 |
| 6730566 | Method for non-thermally nitrided gate formation for high voltage devices | Hiroaki Niimi, Rajesh Khamankar | 2004-05-04 |