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Brian K. Kirkpatrick, Rajesh Khamankar, Malcolm J. Bevan, Husam N. Alshareef, Clinton L. Montgomery +1 more |
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Reliable high voltage gate dielectric layers using a dual nitridation process |
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Monitoring of nitrided oxide gate dielectrics by determination of a wet etch |
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Post high voltage gate dielectric pattern plasma surface treatment |
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Post high voltage gate oxide pattern high-vacuum outgas surface treatment |
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