Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9054056 | Transistor performance using a two-step damage anneal | Hiroaki Niimi, Jarvis Benjamin Jacobs | 2015-06-09 |
| 9029251 | Transistor performance using a two-step damage anneal | Hiroaki Niimi, Jarvis Benjamin Jacobs | 2015-05-12 |
| 8828855 | Transistor performance using a two-step damage anneal | Hiroaki Niimi, Jarvis Benjamin Jacobs | 2014-09-09 |
| 8119470 | Mitigation of gate to contact capacitance in CMOS flow | Shashank S. Ekbote, Borna J. Obradovic, Lindsey Hall, Craig Huffman | 2012-02-21 |
| 7855111 | Border region defect reduction in hybrid orientation technology (HOT) direct silicon bonded (DSB) substrates | Haowen Bu, Shaofeng Yu, Angelo Pinto | 2010-12-21 |
| 7838370 | Highly selective liners for semiconductor fabrication | Narendra Singh Mehta, Wayne Bather | 2010-11-23 |
| 7723173 | Low temperature polysilicon oxide process for high-K dielectric/metal gate stack | James Joseph Chambers | 2010-05-25 |
| 7696021 | Semiconductor device manufactured using a non-contact implant metrology | Narendra Singh Mehta, Benjamin G. Moser | 2010-04-13 |
| 7682988 | Thermal treatment of nitrided oxide to improve negative bias thermal instability | Husam N. Alshareef, Rajesh Khamankar, Cathy Chancellor, Anand Krishnan, Malcolm J. Bevan | 2010-03-23 |
| 7514308 | CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers | Husam N. Alshareef, Rajesh Khamankar | 2009-04-07 |
| 7435651 | Method to obtain uniform nitrogen profile in gate dielectrics | Reima Laaksonen, Terrence J. Riley | 2008-10-14 |
| 7396728 | Methods of improving drive currents by employing strain inducing STI liners | Narendra Singh Mehta, Jonathan McAulay Holt | 2008-07-08 |
| 7384861 | Strain modulation employing process techniques for CMOS technologies | Narendra Singh Mehta, Wayne Bather | 2008-06-10 |
| 7227201 | CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers | Husam N. Alshareef, Rajesh Khamankar | 2007-06-05 |
| 6924239 | Method for removal of hydrocarbon contamination on gate oxide prior to non-thermal nitridation using “spike” radical oxidation | Hiroaki Niimi, Husam N. Alshareef | 2005-08-02 |