| 8802577 |
Method for manufacturing a semiconductor device using a nitrogen containing oxide layer |
Hiroaki Niimi, Jarvis Benjamin Jacobs |
2014-08-12 |
| 8492291 |
Formation of gate dielectrics with uniform nitrogen distribution |
Hiroaki Niimi |
2013-07-23 |
| 7799649 |
Method for forming multi gate devices using a silicon oxide masking layer |
Hiroaki Niimi |
2010-09-21 |
| 7670913 |
Method for forming ultra-thin low leakage multiple gate devices using a masking layer over the semiconductor substrate |
Hiroaki Niimi |
2010-03-02 |
| 7459390 |
Method for forming ultra thin low leakage multi gate devices |
Hiroaki Niimi |
2008-12-02 |
| 7435651 |
Method to obtain uniform nitrogen profile in gate dielectrics |
Ajith Varghese, Terrence J. Riley |
2008-10-14 |
| 7393787 |
Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment |
Hiroaki Niimi, Mahalingam Nandakumar |
2008-07-01 |
| 6866974 |
Semiconductor process using delay-compensated exposure |
Keeho Kim, Jarvis Benjamin Jacobs |
2005-03-15 |
| 6803661 |
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography |
Gautam Thakar, Cameron Gross, Eric A. Joseph |
2004-10-12 |
| 6762130 |
Method of photolithographically forming extremely narrow transistor gate elements |
Jarvis Benjamin Jacobs |
2004-07-13 |
| 6737325 |
Method and system for forming a transistor having source and drain extensions |
Manoj Mehrotra |
2004-05-18 |
| 6624068 |
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography |
Gautam Thakar, Cameron Gross, Eric A. Joseph |
2003-09-23 |
| 6582973 |
Method for controlling a semiconductor manufacturing process |
Padmanabh Krishnagiri |
2003-06-24 |
| 6482688 |
Utilizing amorphorization of polycrystalline structures to achieve T-shaped MOSFET gate |
Chimin Hu, Amitabh Jain, Manoj Mehrotra |
2002-11-19 |
| 6362111 |
Tunable gate linewidth reduction process |
Robert J. Kraft, James B. Friedmann |
2002-03-26 |
| 6214736 |
Silicon processing method |
Antonio Rotondaro, Robert J. Kraft, Charlotte M. Appel, Rebecca J. Gale, Katherine E. Violette |
2001-04-10 |
| 6087220 |
Stack etch method for flash memory devices |
Daty M. Rogers, Cetin Kaya, Freidoon Mehrad, Men-Chee Chen |
2000-07-11 |