Issued Patents All Time
Showing 25 most recent of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272739 | Fin-based laterally-diffused metal-oxide semiconductor field effect transistor | — | 2025-04-08 |
| 11532758 | Low leakage Schottky diode | — | 2022-12-20 |
| 11417646 | NPN heterojunction bipolar transistor in CMOS flow | Terry James Bordelon, Jr., Deborah J. Riley | 2022-08-16 |
| 10978353 | High mobility transistors | Charles Frank Machala, III, Rick L. Wise, Hiroaki Niimi | 2021-04-13 |
| 10163725 | High mobility transistors | Charles Frank Machala, III, Rick L. Wise, Hiroaki Niimi | 2018-12-25 |
| 10103714 | Adjust voltage for thermal mitigation | Palkesh Jain, Yuancheng Chris Pan, Shih-Hsin Jason Hu | 2018-10-16 |
| 10042405 | Adjusting source voltage based on stored information | Palkesh Jain | 2018-08-07 |
| 10026839 | Epitaxial source/drain differential spacers | — | 2018-07-17 |
| 9960162 | Hybrid high-k first and high-k last replacement gate process | Hiroaki Niimi, Mahalingam Nandakumar | 2018-05-01 |
| 9915968 | Systems and methods for adaptive clock design | Palkesh Jain, Virendra Bansal, Keith Alan Bowman | 2018-03-13 |
| 9805986 | High mobility transistors | Hiroaki Niimi, Rick L. Wise | 2017-10-31 |
| 9496262 | High mobility transistors | Charles Frank Machala, III, Rick L. Wise, Hiroaki Niimi | 2016-11-15 |
| 9401365 | Epitaxial source/drain differential spacers | — | 2016-07-26 |
| 9397182 | Transistor structure with silicided source and drain extensions and process for fabrication | — | 2016-07-19 |
| 9397100 | Hybrid high-k first and high-k last replacement gate process | Hiroaki Niimi, Mahalingam Nandakumar | 2016-07-19 |
| 9385117 | NPN heterojunction bipolar transistor in CMOS flow | Terry James Bordelon, Jr., Deborah J. Riley | 2016-07-05 |
| 9356131 | Metal-gate MOS transistor and method of forming the transistor with reduced gate-to-source and gate-to-drain overlap capacitance | Hiroaki Niimi | 2016-05-31 |
| 9324717 | High mobility transistors | Hiroaki Niimi, Rick L. Wise | 2016-04-26 |
| 9000539 | Metal-gate MOS transistor and method of forming the transistor with reduced gate-to-source and gate-to-drain overlap capacitance | Hiroaki Niimi | 2015-04-07 |
| 8906770 | Semiconductor structure that reduces the effects of gate cross diffusion and method of forming the structure | — | 2014-12-09 |
| 8877595 | Transistor structure with silicided source and drain extensions and process for fabrication | — | 2014-11-04 |
| 8691661 | Trench with reduced silicon loss | — | 2014-04-08 |
| 8685831 | Trenches with reduced silicon loss | — | 2014-04-01 |
| 8617954 | Formation of nitrogen containing dielectric layers having an improved nitrogen distribution | Hiroaki Niimi | 2013-12-31 |
| 8592902 | Semiconductor structure that reduces the effects of gate cross diffusion and method of forming the structure | — | 2013-11-26 |