| 7887875 |
Method to reduce photoresist poisoning |
Shangting Detweiler, Brian Trentman |
2011-02-15 |
| 7250372 |
Method for BARC over-etch time adjust with real-time process feedback |
Christopher Baum |
2007-07-31 |
| 7153711 |
Method for improving a drive current for semiconductor devices on a wafer-by-wafer basis |
Kaneez Eshaher Banu, Yuqing Xu, Jeffrey Loewecke, James Douglas Vaughan |
2006-12-26 |
| 6979648 |
Method for BARC over-etch time adjust with real-time process feedback |
Christopher Baum |
2005-12-27 |
| 6686283 |
Shallow trench isolation planarization using self aligned isotropic etch |
Shawn T. Walsh, John E. Campbell, Somit Joshi, Michael J. McGranaghan, Janice D. Makos +8 more |
2004-02-03 |
| 6362111 |
Tunable gate linewidth reduction process |
Reima Laaksonen, Robert J. Kraft |
2002-03-26 |
| 6228741 |
Method for trench isolation of semiconductor devices |
Shawn T. Walsh, John E. Campbell, Thomas Parrill, Der'E Jan, Joshua Robbins +2 more |
2001-05-08 |