Issued Patents All Time
Showing 51–75 of 209 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11004794 | Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof | Tsung-Ling Tsai, Shen-Nan Lee, Mrunal A. Khaderbad, Chung-Wei Hsu, Chen-Hao Wu | 2021-05-11 |
| 11004691 | Mechanism for manufacturing semiconductor device | Chen-Hao Wu, Shen-Nan Lee, Chung-Wei Hsu, Tsung-Ling Tsai | 2021-05-11 |
| 10998239 | Fin isolation structure for FinFET and method of forming the same | Chu-An Lee, Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Huang-Lin Chao | 2021-05-04 |
| 10964549 | Wafer polishing with separated chemical reaction and mechanical polishing | Shen-Nan Lee, Chu-An Lee, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao | 2021-03-30 |
| 10964542 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Ziwei Fang, Fu-Ting Yen | 2021-03-30 |
| 10920105 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao | 2021-02-16 |
| 10879117 | Replacement contacts | Yee-Chia Yeo, Yasutoshi Okuno | 2020-12-29 |
| 10868180 | Method and structure for FinFET devices | Kuo-Yin Lin, Po-Yu Lin | 2020-12-15 |
| 10861752 | Methods of cutting metal gates and structures formed thereof | Tsu-Hsiu Perng, Kai-Chieh Yang, Zhi-Chang Lin, Wei-Hao Wu | 2020-12-08 |
| 10854728 | Vertical device having a protrusion structure | De-Fang Chen, Cheng-Tung Lin, Li-Ting Wang, Chun-Hung Lee, Ming-Ching Chang +1 more | 2020-12-01 |
| 10847413 | Method of forming contact plugs for semiconductor device | Mrunal A. Khaderbad, Yasutoshi Okuno, Sung-Li Wang, Pang-Yen Tsai, Shen-Nan Lee | 2020-11-24 |
| 10847410 | Ruthenium-containing semiconductor structure and method of manufacturing the same | Shen-Nan Lee, Chen-Hao Wu, Chu-An Lee, Chun-Hung Liao, Tsung-Ling Tsai | 2020-11-24 |
| 10840133 | Semiconductor structure with staggered selective growth | Zhi-Chang Lin, Wei-Hao Wu | 2020-11-17 |
| 10774241 | CMP slurry solution for hardened fluid material | Kuo-Yin Lin, Wen-Kuei Liu, Shen-Nan Lee, Kuo-Cheng Lien, Chang-Sheng Lin +1 more | 2020-09-15 |
| 10741392 | Method for forming semiconductor structure | Chia-Wei Su, Fu-Ting Yen | 2020-08-11 |
| 10727076 | Slurry and manufacturing semiconductor using the slurry | Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, Chu-An Lee +2 more | 2020-07-28 |
| 10727065 | Semiconductor structure and manufacturing method thereof | Chia-Wei Su, Fu-Ting Yen, Ting-Ting Chen | 2020-07-28 |
| 10714615 | Method and structure for FinFET devices | Kuo-Yin Lin, Po-Yu Lin | 2020-07-14 |
| 10714395 | Fin isolation structure for FinFET and method of forming the same | Chu-An Lee, Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Huang-Lin Chao | 2020-07-14 |
| 10707114 | Method of forming isolation layer | Bing Chen, Chien-Hsun Wang, Cheng-Tung Lin, Chih-Tang Peng, De-Fang Chen +3 more | 2020-07-07 |
| 10529833 | Integrated circuit with a fin and gate structure and method making the same | Kuo-Cheng Ching, Kuan-Lun Cheng, Chih-Hao Wang | 2020-01-07 |
| 10515809 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Ziwei Fang, Fu-Ting Yen | 2019-12-24 |
| 10510555 | Mechanism for manufacturing semiconductor device | Chen-Hao Wu, Shen-Nan Lee, Chung-Wei Hsu, Tsung-Ling Tsai | 2019-12-17 |
| 10510580 | Dummy fin structures and methods of forming same | Chin-Hsiang Lin, Keng-Chu Lin, Shwang-Ming Jeng, Tsu-Hsiu Perng, Fu-Ting Yen | 2019-12-17 |
| 10510664 | Contact structure and formation thereof | Hong-Mao Lee, Huicheng Chang, Chia-Han Lai, Chi-Hsuan Ni, Cheng-Tung Lin +4 more | 2019-12-17 |