Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12013630 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-06-18 |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Pei-Cheng Hsu, Ping-Hsun Lin, Shih-Che Wang, Hsin-Chang Lee | 2024-06-04 |
| 11988953 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-05-21 |
| 11960201 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Hsin-Chang Lee | 2024-04-16 |
| 11914286 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Jeng-Horng Chen | 2024-02-27 |
| 11906897 | Method for extreme ultraviolet lithography mask treatment | Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Tzu Yi Wang, Jong-Yuh Chang +1 more | 2024-02-20 |
| 11899357 | Lithography mask | Chien-Cheng Chen, Huan-Ling Lee, Chia-Jen Chen, Hsin-Chang Lee | 2024-02-13 |
| 11852969 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Pei-Cheng Hsu, Hao-Ping Cheng | 2023-12-26 |
| 11852965 | Extreme ultraviolet mask with tantalum base alloy absorber | Pei-Cheng Hsu, Hsin-Chang Lee | 2023-12-26 |
| 11829076 | Enhancing lithography operation for manufacturing semiconductor devices | Yi-Chen Su, Tzu Yi Wang | 2023-11-28 |
| 11829062 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Hsin-Chang Lee | 2023-11-28 |
| 11815805 | Mask for extreme ultraviolet photolithography | Wen-Chang Hsueh, Hsin-Chang Lee | 2023-11-14 |
| 11815804 | EUV mask blank and method of making EUV mask blank | Ping-Hsun Lin, Pei-Cheng Hsu, Ching-Fang Yu, Chia-Jen Chen, Hsin-Chang Lee | 2023-11-14 |
| 11789356 | Method of manufacturing EUV photo masks | Hsin-Chang Lee, Pei-Cheng Hsu, Tzu Yi Wang | 2023-10-17 |
| 11726399 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Hsin-Chang Lee | 2023-08-15 |
| 11714350 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Hsin-Chang Lee | 2023-08-01 |
| 11650493 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Hsin-Chang Lee | 2023-05-16 |
| 11619875 | EUV photo masks and manufacturing method thereof | Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu | 2023-04-04 |
| 11592737 | EUV photo masks and manufacturing method thereof | Hung-Yi Tsai, Wei-Che Hsieh, Hsin-Chang Lee, Ping-Hsun Lin, Hao-Ping Cheng +2 more | 2023-02-28 |
| 11561464 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Hsin-Chang Lee | 2023-01-24 |
| 11550229 | Enhancing lithography operation for manufacturing semiconductor devices | Yi-Chen Su, Tzu Yi Wang | 2023-01-10 |
| 11531262 | Mask blanks and methods for depositing layers on mask blank | Hsin-Chang Lee, Pei-Cheng Hsu, Wen-Chang Hsueh | 2022-12-20 |
| 11506969 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Hsin-Chang Lee | 2022-11-22 |
| 11442356 | Lithography mask with an amorphous capping layer | Hsin-Chang Lee, Pei-Cheng Hsu, Chih-Tao Chien, Ming-Wei Chen | 2022-09-13 |
| 11385538 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Pei-Cheng Hsu, Hao-Ping Cheng | 2022-07-12 |