Issued Patents All Time
Showing 126–150 of 163 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8507175 | Patterning process and resist composition | Jun Hatakeyama, Youichi Ohsawa, Kazuhiro Katayama | 2013-08-13 |
| 8426115 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Youichi Ohsawa | 2013-04-23 |
| 8420290 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi, Masayoshi Sagehashi | 2013-04-16 |
| 8394570 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | Takeshi Kinsho, Satoshi Watanabe, Youichi Ohsawa | 2013-03-12 |
| 8361693 | Chemically amplified positive photoresist composition and pattern forming process | Keiichi Masunaga, Akinobu Tanaka, Daisuke Domon, Satoshi Watanabe, Youichi Ohsawa | 2013-01-29 |
| 8323536 | Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film | Takeshi Kinsho, Kazumi Noda, Seiichiro Tachibana | 2012-12-04 |
| 8283104 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | Takeshi Kinsho, Youichi Ohsawa | 2012-10-09 |
| 8247166 | Double patterning process | Katsuya Takemura, Tsunehiro Nishi, Jun Hatakeyama, Takeshi Kinsho | 2012-08-21 |
| 8202677 | Chemically-amplified positive resist composition and patterning process thereof | Takanobu Takeda, Satoshi Watanabe, Youichi Ohsawa, Takeshi Kinsho | 2012-06-19 |
| 8187404 | Method of making a plate-shaped peeling member | Yukio Ohta, Satoru Fukuzawa, Kazuo Hirose | 2012-05-29 |
| 8173354 | Sulfonium salt, resist composition, and patterning process | Youichi Ohsawa | 2012-05-08 |
| 8138754 | Method and apparatus for testing characteristics of thin-film magnetic head | Akio Ogawa, Tsutomu Chikamatsu, Kazuyuki Kobayashi, Haruhiko Yamaguchi, Kazunori Matsuiwa +2 more | 2012-03-20 |
| 8129100 | Double patterning process | Katsuya Takemura, Jun Hatakeyama, Kazumi Noda, Mutsuo Nakashima, Toshinobu Ishihara | 2012-03-06 |
| 8114571 | Photoacid generator, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe | 2012-02-14 |
| 8114570 | Photoacid generator, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa | 2012-02-14 |
| 8105748 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Jun Hatakeyama, Seiichiro Tachibana | 2012-01-31 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Takeshi Kinsho, Youichi Ohsawa, Jun Hatakeyama, Seiichiro Tachibana | 2011-11-15 |
| 8057982 | Monomer, resist composition, and patterning process | Jun Hatakeyama, Takeshi Kinsho, Kazuhiro Katayama | 2011-11-15 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe | 2011-11-08 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Seiichiro Tachibana, Jun Hatakeyama, Youichi Ohsawa | 2011-10-18 |
| 7998657 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-08-16 |
| 7985528 | Positive resist composition and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Masashi Iio | 2011-07-26 |
| 7902385 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-03-08 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi, Takeru Watanabe | 2011-01-11 |