Issued Patents All Time
Showing 76–100 of 163 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10078264 | Resist composition, patterning process, and barium, cesium and cerium salts | Jun Hatakeyama, Takeshi Sasami | 2018-09-18 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Ryo MITSUI, Takayuki Fujiwara, Ryosuke Taniguchi, Koji Hasegawa | 2018-07-17 |
| 10012902 | Positive resist composition and pattern forming process | Jun Hatakeyama, Teppei Adachi | 2018-07-03 |
| 10007178 | Positive resist composition and patterning process | Jun Hatakeyama, Masahiro Fukushima | 2018-06-26 |
| 9989847 | Onium salt compound, resist composition, and pattern forming process | Jun Hatakeyama, Masahiro Fukushima | 2018-06-05 |
| 9958776 | Resist composition and patterning process | Jun Hatakeyama | 2018-05-01 |
| 9958777 | Resist composition and patterning process | Jun Hatakeyama | 2018-05-01 |
| 9910358 | Patterning process and chemically amplified negative resist composition | Jun Hatakeyama | 2018-03-06 |
| 9897914 | Resist composition and patterning process | Jun Hatakeyama | 2018-02-20 |
| 9897916 | Compound, polymer compound, resist composition, and patterning process | Jun Hatakeyama, Masahiro Fukushima, Takayuki Fujiwara | 2018-02-20 |
| 9703193 | Onium salt, resist composition, and patterning process | Takayuki Fujiwara, Ryosuke Taniguchi | 2017-07-11 |
| 9663593 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masayoshi Sagehashi | 2017-05-30 |
| 9665002 | Onium salt compound, resist composition, and pattern forming process | Masahiro Fukushima, Jun Hatakeyama | 2017-05-30 |
| 9645491 | Sulfonium salt, chemically amplified resist composition, and patterning process | Takayuki Fujiwara | 2017-05-09 |
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masayoshi Sagehashi | 2016-12-27 |
| 9523914 | Chemically amplified resist composition and patterning process | Jun Hatakeyama | 2016-12-20 |
| 9519213 | Patterning process and resist composition | Tomohiro Kobayashi, Kazuhiro Katayama, Kentaro Kumaki, Chuanwen Lin, Masahiro Fukushima | 2016-12-13 |
| 9500949 | Chemically-amplified positive resist composition and resist patterning process using the same | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima | 2016-11-22 |
| 9411225 | Photo acid generator, chemically amplified resist composition, and patterning process | Masahiro Fukushima, Kenichi Oikawa, Koji Hasegawa | 2016-08-09 |
| 9366958 | Photoacid generator, chemically amplified resist composition, and patterning process | Masahiro Fukushima | 2016-06-14 |
| 9329476 | Chemically amplified negative resist composition and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2016-05-03 |
| 9250518 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2016-02-02 |
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Seiichiro Tachibana, Jun Hatakeyama | 2016-01-12 |
| 9221742 | Sulfonium salt, chemically amplified resist composition, and pattern forming process | Masahiro Fukushima, Tomohiro Kobayashi, Ryosuke Taniguchi | 2015-12-29 |
| 9223205 | Acid generator, chemically amplified resist composition, and patterning process | Takayuki Nagasawa, Ryosuke Taniguchi | 2015-12-29 |