Issued Patents All Time
Showing 101–125 of 163 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9162967 | Sulfonium salt, polymer, resist composition, and patterning process | Jun Hatakeyama | 2015-10-20 |
| 9164384 | Patterning process and resist composition | Masahiro Fukushima, Tomohiro Kobayashi, Kazuhiro Katayama, Chuanwen Lin | 2015-10-20 |
| 9146464 | Sulfonium salt, polymer, polymer making method, resist composition, and patterning process | Jun Hatakeyama, Teppei Adachi, Masahiro Fukushima | 2015-09-29 |
| 9140988 | Positive resist composition, monomer, polymer, and patterning process | Jun Hatakeyama, Koji Hasegawa | 2015-09-22 |
| 9133100 | Method for synthesizing rare earth metal extractant | Kazuaki Sakaki, Hiroto Sugahara, Tetsuya Kume, Hirochika Naganawa, Kojiro Shimojo | 2015-09-15 |
| 9122155 | Sulfonium salt, resist composition and patterning process | Tomohiro Kobayashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima | 2015-09-01 |
| 9104110 | Polymer, resist composition and patterning process | Jun Hatakeyama | 2015-08-11 |
| 9091918 | Sulfonium salt, polymer, resist composition, and patterning process | Masahiro Fukushima, Jun Hatakeyama, Teppei Adachi | 2015-07-28 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Seiichiro Tachibana, Kazumi Noda, Shozo Shirai, Takeshi Kinsho, Wu-Song Huang +3 more | 2015-06-30 |
| 9057959 | Developer for photosensitive resist material and patterning process | Jun Hatakeyama | 2015-06-16 |
| 9052602 | Developer for photosensitive resist material and patterning process | Jun Hatakeyama | 2015-06-09 |
| 8980527 | Pattern forming process and resist compostion | Jun Hatakeyama | 2015-03-17 |
| 8957160 | Preparation of polymer, resulting polymer, resist composition, and patterning process | Tomohiro Kobayashi, Masayoshi Sagehashi | 2015-02-17 |
| 8956803 | Sulfonium salt, resist composition, and patterning process | Tomohiro Kobayashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima | 2015-02-17 |
| 8900796 | Acid generator, chemically amplified resist composition, and patterning process | Tomohiro Kobayashi, Masayoshi Sagehashi | 2014-12-02 |
| 8841482 | Method for synthesizing rare earth metal extractant | Kazuaki Sakaki, Hiroto Sugahara, Tetsuya Kume, Hirochika Naganawa, Kojiro Shimojo | 2014-09-23 |
| 8815492 | Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process | Youichi Ohsawa, Takeshi Sasami, Jun Hatakeyama | 2014-08-26 |
| 8785105 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Seiichiro Tachibana, Jun Hatakeyama | 2014-07-22 |
| 8748076 | Resist composition and patterning process using the same | Takayuki Nagasawa, Tomohiro Kobayashi, Ryosuke Taniguchi | 2014-06-10 |
| 8741554 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Youichi Ohsawa | 2014-06-03 |
| 8741546 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Youichi Ohsawa | 2014-06-03 |
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Seiichiro Tachibana, Kazumi Noda, Takeshi Kinsho, Wu-Song Huang, Dario L. Goldfarb +2 more | 2014-05-13 |
| 8691490 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | Satoshi Watanabe, Youichi Ohsawa, Keiichi Masunaga, Takeshi Kinsho | 2014-04-08 |
| 8686166 | Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom | Masayoshi Sagehashi, Takeru Watanabe, Youichi Ohsawa, Koji Hasegawa | 2014-04-01 |
| 8609889 | Photoacid generator, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe | 2013-12-17 |