SA

Sang-Hoon Ahn

Samsung: 50 patents #1,852 of 75,807Top 3%
IC Itm Semiconductor Co.: 17 patents #2 of 56Top 4%
Applied Materials: 14 patents #962 of 7,310Top 15%
MC Mitsumi Electric Co.: 2 patents #346 of 935Top 40%
KM Korea Institute Of Machinery & Materials: 1 patents #283 of 729Top 40%
MS Magnachip Semiconductor: 1 patents #215 of 404Top 55%
📍 Cheongju-si, CA: #5 of 14 inventorsTop 40%
Overall (All Time): #21,081 of 4,157,543Top 1%
83
Patents All Time

Issued Patents All Time

Showing 76–83 of 83 patents

Patent #TitleCo-InventorsDate
7325419 Method of forming a phosphorus doped optical core using a PECVD process Hichem M'Saad, Anchuan Wang 2008-02-05
7297376 Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers Kang Sub Yim, Kelvin Chan, Nagarajan Rajagopalan, Josephine Ju-Hwei Chang Liu, Yi Zheng +3 more 2007-11-20
7105460 Nitrogen-free dielectric anti-reflective coating and hardmask Bok Hoen Kim, Sudha Rathi, Christopher Dennis Bencher, Yuxiang Wang, Hichem M'Saad +1 more 2006-09-12
7080528 Method of forming a phosphorus doped optical core using a PECVD process Hichem M'Saad, Anchuan Wang 2006-07-25
7064078 Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme Wei Liu, Jim Zhongyi He, Meihua Shen, Hichem M'Saad, Wendy H. Yeh +1 more 2006-06-20
6927178 Nitrogen-free dielectric anti-reflective coating and hardmask Bok Hoen Kim, Sudha Rathi, Christopher Dennis Bencher, Yuxiang Wang, Hichem M'Saad +4 more 2005-08-09
6853043 Nitrogen-free antireflective coating for use with photolithographic patterning Wendy H. Yeh, Christopher Dennis Bencher, Hichem M'Saad, Sudha Rathi 2005-02-08
6559074 Method of forming a silicon nitride layer on a substrate Steven Chen, Xianzhi Tao, Shulin Wang, Lee Luo, Kegang Huang 2003-05-06