Issued Patents All Time
Showing 76–100 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6327022 | Projection exposure method and apparatus | — | 2001-12-04 |
| 6319895 | Lactoferrin tablets | Mamoru Tomita, Ryo Kato, Yuzo Asano, Yuriko Iiyama, Tsutomu Kudo | 2001-11-20 |
| RE37391 | Exposure method and projection exposure apparatus | — | 2001-09-25 |
| 6279881 | Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object | — | 2001-08-28 |
| 6238851 | Exposure method | — | 2001-05-29 |
| 6235063 | Fiber treating composition | Atsushi Nakayama, Masayuki Komeyama, Shouji Takekoshi, Ichiro Ohsawa | 2001-05-22 |
| 6225012 | Method for positioning substrate | Yoshiki Kida, Masahiko Okumura | 2001-05-01 |
| 6198527 | Projection exposure apparatus and exposure method | — | 2001-03-06 |
| 6151102 | Projection exposure apparatus | — | 2000-11-21 |
| 6141107 | Apparatus for detecting a position of an optical mark | Nobutaka Magome, Masaharu Kawakubo | 2000-10-31 |
| 6115107 | Exposure apparatus | — | 2000-09-05 |
| 6100515 | Scanning exposure method and apparatus in which a mask and a substrate are moved at different scan velocities and exposure parameters are varied | Shinji Wakamoto | 2000-08-08 |
| RE36799 | Projection optical apparatus using plural wavelengths of light | — | 2000-08-01 |
| RE36730 | Projection exposure apparatus having an off-axis alignment system and method of alignment therefor | — | 2000-06-13 |
| 6051843 | Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement | — | 2000-04-18 |
| 6002467 | Exposure apparatus and method | Takuzo Kashima, Toshihiko Tsuji | 1999-12-14 |
| 5995263 | Projection exposure apparatus | Noriaki Tokuda | 1999-11-30 |
| 5995234 | Method and apparatus for the alignment of a substrate | — | 1999-11-30 |
| 5994006 | Projection exposure methods | — | 1999-11-30 |
| 5991009 | Illumination optical apparatus using different number of light sources under different exposure modes, method of operating and method of manufacturing thereof | Naomasa Shiraishi | 1999-11-23 |
| 5959721 | Projection exposure apparatus and projection exposure method | — | 1999-09-28 |
| 5894341 | Exposure apparatus and method for measuring a quantity of light with temperature variations | Toshihiko Tsuji | 1999-04-13 |
| 5892572 | Projection exposure apparatus and method | — | 1999-04-06 |
| 5883704 | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system | Kazuo Ushida, Seiro Murakami, Tohru Kiuchi, Yasuaki Tanaka | 1999-03-16 |
| 5861944 | Exposure apparatus | — | 1999-01-19 |