KN

Kenji Nishi

NI Nikon: 130 patents #3 of 2,493Top 1%
KA Kajima: 2 patents #67 of 383Top 20%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
MC Morinaga Milk Industry Co.: 2 patents #82 of 303Top 30%
NK Nippon Kogaku K.K.: 2 patents #156 of 382Top 45%
GS Gemalto Sa: 1 patents #192 of 462Top 45%
AD Advantest: 1 patents #714 of 1,193Top 60%
OC Oki Electric Industry Co.: 1 patents #1,459 of 2,807Top 55%
KC Kuraray Co.: 1 patents #981 of 1,827Top 55%
SN Sendai Nikon: 1 patents #1 of 13Top 8%
Overall (All Time): #6,487 of 4,157,543Top 1%
147
Patents All Time

Issued Patents All Time

Showing 101–125 of 147 patents

Patent #TitleCo-InventorsDate
5854671 Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure 1998-12-29
5844247 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement 1998-12-01
5842824 Substrate transport apparatus 1998-12-01
5815249 Illumination optical apparatus and method having a wavefront splitter and an optical integrator Naomasa Shiraishi 1998-09-29
5815248 Illumination optical apparatus and method having a wavefront splitter and an optical integrator Naomasa Shiraishi 1998-09-29
5798195 Stepping accuracy measuring method 1998-08-25
5793474 Exposure apparatus wherein a wafer contact portion of a movable stage includes linear ridges 1998-08-11
5760454 Pattern form of an active region of a MOS type semiconductor device 1998-06-02
5739899 Projection exposure apparatus correcting tilt of telecentricity Seiro Murakami, Hiroshi Chiba 1998-04-14
5737441 Aligning method and apparatus 1998-04-07
5734478 Projection exposure apparatus Nobutaka Magome, Hideo Mizutani 1998-03-31
5693439 Exposure method and apparatus Yasuaki Tanaka, Seiro Murakami 1997-12-02
5682243 Method of aligning a substrate 1997-10-28
5674651 Alignment method for use in an exposure system 1997-10-07
5657129 Method and apparatus for the alignment of a substrate 1997-08-12
5646413 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement 1997-07-08
5634231 Semiconductor manufacturing apparatus 1997-06-03
5591958 Scanning exposure method and apparatus Shinji Wakamoto 1997-01-07
5561606 Method for aligning shot areas on a substrate Kazuya Ota, Masaharu Kawakubo 1996-10-01
5559582 Exposure apparatus Masaaki Aoyama 1996-09-24
5539497 Projection exposure apparatus and exposure method 1996-07-23
5493403 Method and apparatus for the alignment of a substrate 1996-02-20
5477304 Projection exposure apparatus 1995-12-19
5473410 Projection exposure apparatus 1995-12-05
5473435 Method of measuring the bent shape of a movable mirror of an exposure apparatus Takashi Masuyuki, Shinichi Takagi 1995-12-05