Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8605248 | Exposure method and lithography system | — | 2013-12-10 |
| 8130362 | Correction method and exposure apparatus | — | 2012-03-06 |
| 7817242 | Exposure method and device manufacturing method, exposure apparatus, and program | Yuho Kanaya, Chiaki Nakagawa, Takahisa Kikuchi, Masahiko Akizuki | 2010-10-19 |
| 6876946 | Alignment method and apparatus therefor | Masahiko Yasuda, Osamu Furukawa, Hiroki Tateno, Nobutaka Magome | 2005-04-05 |
| 6372395 | Exposure method for overlaying one mask pattern on another | Ryoichi Kaneko | 2002-04-16 |
| 6331369 | Exposure methods for overlaying one mask pattern on another | Ryoichi Kaneko | 2001-12-18 |
| 6278957 | Alignment method and apparatus therefor | Masahiko Yasuda, Osamu Furukawa, Hiroki Tateno, Nobutaka Magome | 2001-08-21 |
| 6219130 | Position detecting apparatus | — | 2001-04-17 |
| 6163366 | Exposure method and apparatus | Hiroki Okamoto, Shinji Mizutani | 2000-12-19 |
| 6141107 | Apparatus for detecting a position of an optical mark | Kenji Nishi, Nobutaka Magome | 2000-10-31 |
| 6100987 | Position detecting apparatus | — | 2000-08-08 |
| 5989761 | Exposure methods for overlaying one mask pattern on another | Ryoichi Kaneko | 1999-11-23 |
| 5863680 | Exposure method utilizing alignment of superimposed layers | Ryoichi Kaneko | 1999-01-26 |
| 5760411 | Alignment method for positioning a plurality of shot areas on a substrate | — | 1998-06-02 |
| 5654553 | Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate | Masahiko Okumura | 1997-08-05 |
| 5561606 | Method for aligning shot areas on a substrate | Kazuya Ota, Kenji Nishi | 1996-10-01 |