Issued Patents All Time
Showing 26–50 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7932989 | Liquid jet and recovery system for immersion lithography | W. Thomas Novak, Andrew J. Hazelton | 2011-04-26 |
| 7929111 | Environmental system including a transport region for an immersion lithography apparatus | W. Thomas Novak, Andrew J. Hazelton | 2011-04-19 |
| 7929110 | Environmental system including a transport region for an immersion lithography apparatus | W. Thomas Novak, Andrew J. Hazelton | 2011-04-19 |
| 7869000 | Stage assembly with lightweight fine stage and low transmissibility | Yoichi Arai, Andrew J. Hazelton, Michael Binnard, W. Thomas Novak, Kirk Lok | 2011-01-11 |
| 7830046 | Damper for a stage assembly | Michael Binnard, Jean-Marc Gery | 2010-11-09 |
| 7804583 | EUV reticle handling system and method | Alton H. Phillips, Michael Sogard | 2010-09-28 |
| 7717966 | Barrier assembly for an exposure apparatus | — | 2010-05-18 |
| 7692768 | Iron core motor driven automatic reticle blind | Michael Binnard, Christopher S. Margeson | 2010-04-06 |
| 7688421 | Fluid pressure compensation for immersion lithography lens | W. Thomas Novak | 2010-03-30 |
| 7683506 | CI-core actuator for long travel in a transverse direction | — | 2010-03-23 |
| 7591561 | Liquid cooled mirror for use in extreme ultraviolet lithography | Alton H. Phillips, Derek Coon | 2009-09-22 |
| 7583361 | System for controlling a dual mover assembly for an exposure apparatus | Yi-Ping Hsin, Hideyuki Hashimoto, Jin Nishikawa, Bausan Yuan | 2009-09-01 |
| 7522259 | Cleanup method for optics in immersion lithography | Andrew J. Hazelton, Hidemi Kawai, W Thomas Novak | 2009-04-21 |
| 7477358 | EUV reticle handling system and method | Alton H. Phillips, Michael Sogard | 2009-01-13 |
| 7466396 | Lithography apparatus and method utilizing pendulum interferometer system | Michael Binnard, W. Thomas Novak, Hiroto Horikawa, Yoshifumi Nakakoji, Hideaki Sakamoto | 2008-12-16 |
| 7443482 | Liquid jet and recovery system for immersion lithography | W. Thomas Novak, Andrew J. Hazelton | 2008-10-28 |
| 7345742 | Environmental system including a transport region for an immersion lithography apparatus | W. Thomas Novak, Andrew J. Hazelton | 2008-03-18 |
| 7251017 | Environmental system including a transport region for an immersion lithography apparatus | W. Thomas Novak, Andrew J. Hazelton | 2007-07-31 |
| 7172493 | Fine force actuator assembly for chemical mechanical polishing apparatuses | W. Thomas Novak, Pai-Hsueh Yang, Bausan Yuan | 2007-02-06 |
| 7095482 | Multiple system vibration isolator | Alton H. Phillips, Andrew J. Hazelton | 2006-08-22 |
| 6953109 | Vibration isolator with low lateral stiffness | Alton H. Phillips | 2005-10-11 |
| 6937911 | Compensating for cable drag forces in high precision stages | — | 2005-08-30 |
| 6927838 | Multiple stage, stage assembly having independent stage bases | Kazuya Ono, Andrew J. Hazelton | 2005-08-09 |
| 6922293 | Kinematic optical mounting assembly with flexures | Alton H. Phillips, Masato Hatasawa | 2005-07-26 |
| 6903346 | Stage assembly having a follower assembly | Michael Sogard, Michael Kovalerchik | 2005-06-07 |