Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9618852 | Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets | Andrew J. Hazelton | 2017-04-11 |
| 9329492 | Apparatus and method to control vacuum at porous material using multiple porous materials | Alex Ka Tim Poon, Leonard Wai Fung Kho | 2016-05-03 |
| 9217933 | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka | 2015-12-22 |
| 9176394 | Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka | 2015-11-03 |
| 8934080 | Apparatus and methods for recovering fluid in immersion lithography | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2015-01-13 |
| 8797500 | Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface | Andrew J. Hazelton | 2014-08-05 |
| 8743343 | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka | 2014-06-03 |
| 8634055 | Apparatus and method to control vacuum at porous material using multiple porous materials | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2014-01-21 |
| 8610873 | Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka | 2013-12-17 |
| 8497973 | Immersion lithography fluid control system regulating gas velocity based on contact angle | Andrew J. Hazelton | 2013-07-30 |
| 8477284 | Apparatus and method to control vacuum at porous material using multiple porous materials | Alex Ka Tim Poon, Leonard Wai Fung Kho | 2013-07-02 |
| 8400610 | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanak | 2013-03-19 |
| 8289497 | Apparatus and methods for recovering fluid in immersion lithography | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2012-10-16 |
| 8237911 | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2012-08-07 |
| 8102501 | Immersion lithography fluid control system using an electric or magnetic field generator | Andrew J. Hazelton | 2012-01-24 |
| 8068209 | Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool | Alex Ka Tim Poon, Leonard Wai Fung Kho, Guarav Keswani | 2011-11-29 |
| 7903233 | Offset partial ring seal in immersion lithographic system | — | 2011-03-08 |
| 7745079 | Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment | — | 2010-06-29 |
| 7591561 | Liquid cooled mirror for use in extreme ultraviolet lithography | Alton H. Phillips, Douglas C. Watson | 2009-09-22 |
| 7576833 | Gas curtain type immersion lithography tool using porous material for fluid removal | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2009-08-18 |
| 7532309 | Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid | Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani | 2009-05-12 |
| 7339650 | Immersion lithography fluid control system that applies force to confine the immersion liquid | Andrew J. Hazelton | 2008-03-04 |
| 6847431 | Method and device for controlling fluid flow in an optical assembly | Bernard Fay | 2005-01-25 |