| 9618852 |
Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets |
Andrew J. Hazelton |
2017-04-11 |
| 9329492 |
Apparatus and method to control vacuum at porous material using multiple porous materials |
Alex Ka Tim Poon, Leonard Wai Fung Kho |
2016-05-03 |
| 9217933 |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka |
2015-12-22 |
| 9176394 |
Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka |
2015-11-03 |
| 8934080 |
Apparatus and methods for recovering fluid in immersion lithography |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2015-01-13 |
| 8797500 |
Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface |
Andrew J. Hazelton |
2014-08-05 |
| 8743343 |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka |
2014-06-03 |
| 8634055 |
Apparatus and method to control vacuum at porous material using multiple porous materials |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2014-01-21 |
| 8610873 |
Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanaka |
2013-12-17 |
| 8497973 |
Immersion lithography fluid control system regulating gas velocity based on contact angle |
Andrew J. Hazelton |
2013-07-30 |
| 8477284 |
Apparatus and method to control vacuum at porous material using multiple porous materials |
Alex Ka Tim Poon, Leonard Wai Fung Kho |
2013-07-02 |
| 8400610 |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Daishi Tanak |
2013-03-19 |
| 8289497 |
Apparatus and methods for recovering fluid in immersion lithography |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2012-10-16 |
| 8237911 |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2012-08-07 |
| 8102501 |
Immersion lithography fluid control system using an electric or magnetic field generator |
Andrew J. Hazelton |
2012-01-24 |
| 8068209 |
Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Guarav Keswani |
2011-11-29 |
| 7903233 |
Offset partial ring seal in immersion lithographic system |
— |
2011-03-08 |
| 7745079 |
Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment |
— |
2010-06-29 |
| 7591561 |
Liquid cooled mirror for use in extreme ultraviolet lithography |
Alton H. Phillips, Douglas C. Watson |
2009-09-22 |
| 7576833 |
Gas curtain type immersion lithography tool using porous material for fluid removal |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2009-08-18 |
| 7532309 |
Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani |
2009-05-12 |
| 7339650 |
Immersion lithography fluid control system that applies force to confine the immersion liquid |
Andrew J. Hazelton |
2008-03-04 |
| 6847431 |
Method and device for controlling fluid flow in an optical assembly |
Bernard Fay |
2005-01-25 |