WL

Weimin Li

Micron: 72 patents #218 of 6,345Top 4%
ZT Zte: 27 patents #102 of 3,593Top 3%
EN Entegris: 8 patents #75 of 643Top 15%
Applied Materials: 5 patents #2,165 of 7,310Top 30%
XC Xi'An Zhongxing New Software Co.: 4 patents #68 of 714Top 10%
AC Advanced Technology & Materials Co.: 4 patents #103 of 410Top 30%
Huawei: 3 patents #4,041 of 15,535Top 30%
Johnson & Johnson: 2 patents #3,442 of 7,810Top 45%
WU West China Hospital, Sichuan University: 2 patents #9 of 92Top 10%
3C 3Com: 1 patents #653 of 1,190Top 55%
GC Genius Electronic Optical (Xiamen) Co.: 1 patents #80 of 115Top 70%
MI Mosaid Technologies Incorporated: 1 patents #115 of 170Top 70%
CC Cdgm Glass Co.: 1 patents #11 of 28Top 40%
📍 Lo Wu, CT: #1 of 12 inventorsTop 9%
Overall (All Time): #7,435 of 4,157,543Top 1%
137
Patents All Time

Issued Patents All Time

Showing 51–75 of 137 patents

Patent #TitleCo-InventorsDate
9963898 Underwater cleaning robot 2018-05-08
9946048 Lens barrel module and lens assembly including the same Haibin Zhan, Hung-Chang Cho, Weiwei Fu, Zhenmu Chen 2018-04-17
9637395 Fluorine free tungsten ALD/CVD process David W. Peters, Scott L. Battle, William Hunks 2017-05-02
9538477 Uplink power control method, terminal and base station Yu Ngok Li, Lu Ren, Peng Hao, Wenfeng Zhang 2017-01-03
9443736 Silylene compositions and methods of use thereof Thomas M. Cameron, Susan DiMeo, Bryan C. Hendrix 2016-09-13
9337054 Precursors for silicon dioxide gap fill William Hunks, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau 2016-05-10
9322066 Predictors for cancer treatment Deborah Ricci, Erin DeVay Henitz 2016-04-26
8663735 In situ generation of RuO4 for ALD of Ru and Ru related materials Chongying Xu, Thomas M. Cameron 2014-03-04
8574675 Method and composition for depositing ruthenium with assistive metal species Jorge A. Lubguban, Thomas M. Cameron, Chongying Xu 2013-11-05
8486612 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Gurtej S. Sandhu 2013-07-16
8367575 High-refractivity low-dispersion optical glass Bo Kuang, Wei Wen 2013-02-05
8330136 High concentration nitrogen-containing germanium telluride based memory devices and processes of making Jun Zheng, Jeffrey F. Roeder, Philip S. H. Chen 2012-12-11
8093140 Amorphous Ge/Te deposition process Philip S. H. Chen, William Hunks, Tianniu Chen, Matthias Stender, Chongying Xu +1 more 2012-01-10
7910177 Sequential pulse deposition 2011-03-22
7858518 Method for forming a selective contact and local interconnect in situ Christopher W. Hill, Gurtej S. Sandhu 2010-12-28
7855154 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Gurtej S. Sandhu 2010-12-21
7678460 Intermediate semiconductor device structures using photopatternable, dielectric materials Gurtej S. Sandhu 2010-03-16
7632737 Protection in integrated circuits Neal R. Rueger, William Budge 2009-12-15
7550816 Filled trench isolation structure Li Li, Gurtej S. Sandhu 2009-06-23
7521354 Low k interlevel dielectric layer fabrication methods Zhiping Yin, William Budge 2009-04-21
7494894 Protection in integrated circuits Neal R. Rueger, William Budge 2009-02-24
7470635 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry, methods of forming trench isolation in the fabrication of integrated circuitry, methods of depositing silicon dioxide-comprising layers in the fabrication of integrated circuitry, and methods of forming bit line over capacitor arrays of memory cells Gurtej S. Sandhu 2008-12-30
7470632 Method of depositing a silicon dioxide comprising layer doped with at least one of P, B and Ge Chris Hill, Gurtej S. Sandhu 2008-12-30
7341957 Masking structure having multiple layers including amorphous carbon layer Gurtej S. Sandhu, Zhiping Yin 2008-03-11
7314837 Chemical treatment of semiconductor substrates Li Li 2008-01-01