Issued Patents All Time
Showing 101–125 of 137 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6921710 | Technique for high efficiency metalorganic chemical vapor deposition | Sam Yang | 2005-07-26 |
| 6918960 | CVD of PtRh with good adhesion and morphology | Mark Visokay | 2005-07-19 |
| 6889141 | Method and system to flexibly calculate hydraulics and hydrology of watersheds automatically | Qian Gao | 2005-05-03 |
| 6866900 | Deposition and chamber treatment methods | Neal R. Rueger | 2005-03-15 |
| 6835995 | Low dielectric constant material for integrated circuit fabrication | — | 2004-12-28 |
| 6833576 | Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers | Vishnu K. Agarwal, Garo Derderian, Gurtej S. Sandhu, Mark Visokay, Cem Basceri +1 more | 2004-12-21 |
| 6833605 | Method of making a memory cell capacitor with Ta2O5 dielectric | — | 2004-12-21 |
| 6828683 | Semiconductor devices, and semiconductor processing methods | Zhiping Yin | 2004-12-07 |
| 6818500 | Method of making a memory cell capacitor with Ta2O5 dielectric | — | 2004-11-16 |
| 6815819 | In situ plasma pre-deposition wafer treatment in chemical vapor deposition technology for semiconductor integrated circuit applications | — | 2004-11-09 |
| 6777308 | Method of improving HDP fill process | Li Li, Gurtej S. Sandhu | 2004-08-17 |
| 6756293 | Combined gate cap or digit line and spacer deposition using HDP | Sujit Sharan, Gurtej S. Sandhu | 2004-06-29 |
| 6719919 | Composition of matter | Zhiping Yin | 2004-04-13 |
| 6676756 | Technique for high efficiency metalorganic chemical vapor deposition | Sam Yang | 2004-01-13 |
| 6613656 | Sequential pulse deposition | — | 2003-09-02 |
| 6596583 | Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers | Vishnu K. Agarwal, Garo Derderian, Gurtej S. Sandhu, Mark Visokay, Cem Basceri +1 more | 2003-07-22 |
| 6589611 | Deposition and chamber treatment methods | Neal R. Rueger | 2003-07-08 |
| 6576538 | Technique for high efficiency metalorganic chemical vapor deposition | Sam Yang | 2003-06-10 |
| 6573571 | Semiconductor structure including metal nitride and metal silicide layers over active area and gate stack | — | 2003-06-03 |
| 6539341 | Method and apparatus for log information management and reporting | Sajid Hussain, Andrew Nakao, Vikas Khandelwal | 2003-03-25 |
| 6524975 | Combined gate cap or digit line and spacer deposition using HDP | Sujit Sharan, Gurtej S. Sandhu | 2003-02-25 |
| 6515363 | In situ plasma pre-deposition wafer treatment in chemical vapor deposition technology for semiconductor integrated circuit applications | — | 2003-02-04 |
| 6503822 | Methods for insitu plasma pre-deposition wafer treatment in chemical vapor deposition technology for semiconductor integrated circuit applications | — | 2003-01-07 |
| 6489199 | Multiple step methods for forming conformal layers | Gurtej S. Sandhu | 2002-12-03 |
| 6472309 | In situ plasma pre-deposition wafer treatment in chemical vapor deposition technology for semiconductor integrated circuit applications | — | 2002-10-29 |