Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7858518 | Method for forming a selective contact and local interconnect in situ | Weimin Li, Gurtej S. Sandhu | 2010-12-28 |
| 7846812 | Methods of forming trench isolation and methods of forming floating gate transistors | — | 2010-12-07 |
| 7737047 | Semiconductor constructions, and methods of forming dielectric materials | — | 2010-06-15 |
| 7611971 | Method of removing residual contaminants from an environment | Demetrius Sarigiannis, Cem Basceri, Garo Derderian | 2009-11-03 |
| 7402533 | Masking without photolithography during the formation of a semiconductor device | — | 2008-07-22 |
| 7271050 | Silicon nanocrystal capacitor and process for forming same | — | 2007-09-18 |
| 7247561 | Method of removing residual contaminants from an environment | Demetrius Sarigiannis, Cem Basceri, Garo Derderian | 2007-07-24 |
| 7214979 | Selectively deposited silicon oxide layers on a silicon substrate | William Budge, Gurtej S. Sandhu | 2007-05-08 |
| 7192893 | Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off | William Budge, Gurtej S. Sandhu | 2007-03-20 |
| 7173304 | Method of manufacturing devices comprising conductive nano-dots, and devices comprising same | Ronald A. Weimer | 2007-02-06 |
| 7101814 | Masking without photolithography during the formation of a semiconductor device | — | 2006-09-05 |
| 6924969 | Silicon nanocrystal capacitor and process for forming same | — | 2005-08-02 |
| 6808983 | Silicon nanocrystal capacitor and process for forming same | — | 2004-10-26 |
| 6777351 | Masking without photolithography during the formation of a semiconductor device | — | 2004-08-17 |
| 6617230 | Use of selective ozone teos oxide to create variable thickness layers and spacers | William Budge, Gurtej S. Sandhu | 2003-09-09 |
| 6602807 | Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off | William Budge, Gurtej S. Sandhu | 2003-08-05 |
| 6503851 | Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off | William Budge, Gurtej S. Sandhu | 2003-01-07 |
| 6372643 | Method for forming a selective contact and local interconnect in situ and semiconductor devices carrying the same | Weimin Li, Gurtej S. Sandhu | 2002-04-16 |
| 6368986 | Use of selective ozone TEOS oxide to create variable thickness layers and spacers | William Budge, Gurtej S. Sandhu | 2002-04-09 |
| 6198144 | Passivation of sidewalls of a word line stack | Pai-Hung Pan, Martin C. Roberts, Gurtei Sandhu, Weimin Li, Vishnu K. Agarwal | 2001-03-06 |
| 5960303 | Process of forming titanium silicide interconnects | — | 1999-09-28 |
| 4784973 | Semiconductor contact silicide/nitride process with control for silicide thickness | E. Henry Stevens, Paul J. McClure | 1988-11-15 |