Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8277604 | Antenna for plasma processor and apparatus | Andras Kuthi | 2012-10-02 |
| 8241701 | Processes and systems for engineering a barrier surface for copper deposition | Yezdi Dordi, John M. Boyd, Tiruchirapalli Arunagiri, Hyungsuk Alexander Yoon, Fritz Redeker +1 more | 2012-08-14 |
| 8211238 | System, method and apparatus for self-cleaning dry etch | Andrew D. Bailey, III, Shrikant Lohokare, Yunsang Kim | 2012-07-03 |
| 8084356 | Methods of low-K dielectric and metal process integration | Yezdi Dordi | 2011-12-27 |
| 7905982 | Antenna for plasma processor apparatus | Andras Kuthi | 2011-03-15 |
| 7884017 | Thermal methods for cleaning post-CMP wafers | Zhonghui Wang, Tiruchirapalli Arunagiri, Fritz Redeker, Yezdi Dordi, John M. Boyd +3 more | 2011-02-08 |
| 7709400 | Thermal methods for cleaning post-CMP wafers | Zhonghui Wang, Tiruchirapalli Arunagiri, Fritz Redeker, Yezdi Dordi, John M. Boyd +3 more | 2010-05-04 |
| 7611640 | Minimizing arcing in a plasma processing chamber | Andras Kuthi, Andrew D. Bailey, III, Butch Berney | 2009-11-03 |
| 7583492 | Method of determining the correct average bias compensation voltage during a plasma process | — | 2009-09-01 |
| 7540935 | Plasma oxidation and removal of oxidized material | Yunsang Kim, Andrew D. Bailey, III, Hyungsuk Alexander Yoon | 2009-06-02 |
| 7480571 | Apparatus and methods for improving the stability of RF power delivery to a plasma load | Andras Kuthi, Andrew D. Bailey, III | 2009-01-20 |
| 7218503 | Method of determining the correct average bias compensation voltage during a plasma process | — | 2007-05-15 |
| 7196896 | Dechucking method and apparatus for workpieces in vacuum processors | John Holland | 2007-03-27 |
| 7140374 | System, method and apparatus for self-cleaning dry etch | Andrew D. Bailey, III, Shrikant Lohokare, Yunsang Kim | 2006-11-28 |
| 7086347 | Apparatus and methods for minimizing arcing in a plasma processing chamber | Andras Kuthi, Andrew D. Bailey, III, Butch Berney | 2006-08-08 |
| 6965506 | System and method for dechucking a workpiece from an electrostatic chuck | — | 2005-11-15 |
| 6876155 | Plasma processor apparatus and method, and antenna | Andras Kuthi | 2005-04-05 |
| 6842147 | Method and apparatus for producing uniform processing rates | Andras Kuthi, Mark Wilcoxson, Andrew D. Bailey, III | 2005-01-11 |
| 6838832 | Apparatus and methods for improving the stability of RF power delivery to a plasma load | Andras Kuthi, Andrew D. Bailey, III | 2005-01-04 |
| 6790375 | Dechucking method and apparatus for workpieces in vacuum processors | John Holland | 2004-09-14 |
| 6646385 | Plasma excitation coil | Brian McMillin, Frank Y. Lin | 2003-11-11 |
| 6441555 | Plasma excitation coil | Brian McMillin, Frank Y. Lin | 2002-08-27 |
| 6400458 | Interferometric method for endpointing plasma etch processes | — | 2002-06-04 |
| 6265831 | Plasma processing method and apparatus with control of rf bias | John Holland, Christopher H. Olson | 2001-07-24 |
| 6259334 | Methods for controlling an RF matching network | — | 2001-07-10 |