Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7968272 | Semiconductor device manufacturing method to form resist pattern | Daisuke Kawamura, Eishi Shiobara, Tomoyuki Takeishi, Kei Hayasaki, Shinichi Ito +1 more | 2011-06-28 |
| 7794922 | Pattern forming method and method of manufacturing semiconductor device | Shinichi Ito, Kentaro Matsunaga, Daisuke Kawamura | 2010-09-14 |
| 7687227 | Resist pattern forming method and manufacturing method of semiconductor device | Eishi Shiobara, Daisuke Kawamura, Shinichi Ito | 2010-03-30 |
| 7319944 | Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist | Hiroko Nakamura, Shoji Mimotogi | 2008-01-15 |
| 7300884 | Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device | Yuriko Seino, Yasuhiko Sato | 2007-11-27 |
| 7198886 | Method for forming pattern | Yasuhiko Sato, Tsuyoshi Shibata, Junko Ohuchi | 2007-04-03 |
| 7026099 | Pattern forming method and method for manufacturing semiconductor device | Hirokazu Kato, Eishi Shiobara, Daisuke Kawamura, Hiroko Nakamura | 2006-04-11 |
| 6806021 | Method for forming a pattern and method of manufacturing semiconductor device | Yasuhiko Sato | 2004-10-19 |
| 6703181 | Photosensitive composition having uniform concentration distribution of components and pattern formation method using the same | Takao Hayashi, Kazuo Sato, Kenji Chiba, Masataka Miyamura | 2004-03-09 |
| 6576562 | Manufacturing method of semiconductor device using mask pattern having high etching resistance | Junko Ohuchi, Yasuhiko Sato, Eishi Shiobara, Hisataka Hayashi, Tokuhisa Ohiwa | 2003-06-10 |
| 6569595 | Method of forming a pattern | Yasuhiko Sato, Eishi Shiobara, Shuji Hayase, Yoshihiko Nakano | 2003-05-27 |
| 6420271 | Method of forming a pattern | Yasuhiko Sato, Eishi Shiobara, Motoyuki Sato, Hiroshi Tomita, Tokuhisa Ohiwa +2 more | 2002-07-16 |
| 6270948 | Method of forming pattern | Yasuhiko Sato, Yoshihiko Nakano, Rikako Kani, Shuji Hayase, Eishi Shiobara +4 more | 2001-08-07 |
| 6225033 | Method of forming a resist pattern | Kentaro Matsunaga, Shoji Mimotogi, Katsuya Okumura | 2001-05-01 |
| 6054254 | Composition for underlying film and method of forming a pattern using the film | Yasuhiko Sato | 2000-04-25 |
| 6025117 | Method of forming a pattern using polysilane | Yoshihiko Nakano, Rikako Kani, Shuji Hayase, Yasuhiko Sato, Seiro Miyoshi +5 more | 2000-02-15 |
| 5994007 | Pattern forming method utilizing first insulative and then conductive overlayer and underlayer | Yasuhiko Sato, Atsushi Ando, Yoshihiko Nakano, Shuji Hayase, Rikako Kani | 1999-11-30 |
| 5889678 | Topography simulation method | Soichi Inoue, Satoshi Tanaka, Shoji Mimotogi | 1999-03-30 |
| RE35821 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Akitoshi Kumagae, Kazuo Sato +2 more | 1998-06-09 |
| 5744281 | Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive | Hirokazu Niki, Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Kazuo Sato +2 more | 1998-04-28 |
| 5658706 | Resist composition for forming a pattern comprising a pyridinium compound as an additive | Hirokazu Niki, Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Kazuo Sato +2 more | 1997-08-19 |
| 5580702 | Method for forming resist patterns | Rumiko Hayase, Hirokazu Niki, Noahiko Oyasato, Yoshihito Kobayashi, Shuzi Nayase | 1996-12-03 |
| 5403695 | Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups | Rumiko Hayase, Hirokazu Niki, Naohiko Oyasato, Yoshihito Kobayashi, Shuzi Hayase | 1995-04-04 |
| 5326675 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Akitoshi Kumagae, Kazuo Sato +2 more | 1994-07-05 |
| 5279921 | Pattern formation resist and pattern formation method | Yoshihito Kobayashi, Hirokazu Niki | 1994-01-18 |