MR

Martin Lee Riker

Applied Materials: 46 patents #183 of 7,310Top 3%
Overall (All Time): #61,466 of 4,157,543Top 2%
46
Patents All Time

Issued Patents All Time

Showing 1–25 of 46 patents

Patent #TitleCo-InventorsDate
12325909 EM source for enhanced plasma control Alexander Jansen, Keith A. Miller, Prashanth Kothnur, David Gunther, Emily Schooley 2025-06-10
12203163 Methods for shaping magnetic fields during semiconductor processing Goichi Yoshidome, Suhas Bangalore Umesh, Sushil Arun Samant, Wei Lei, Kishor Kalathiparambil +4 more 2025-01-21
12094699 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Keith A. Miller, William Fruchterman +4 more 2024-09-17
D1038901 Collimator for a physical vapor deposition chamber Fuhong Zhang, Suhas Bangalore Umesh, Madan Kumar Shimoga Mylarappa 2024-08-13
11990319 Methods and apparatus for processing a substrate Yida LIN, Rui Li, Haitao Wang, Noufal Kappachali, Xiangjin Xie 2024-05-21
D1026839 Collimator for a physical vapor deposition (PVD) chamber Luke Vianney Varkey, Xiangjin Xie 2024-05-14
D1026054 Collimator for a physical vapor deposition (PVD) chamber Keith A. Miller, Luke Vianney Varkey, Xiangjin Xie, Kishor Kalathiparambil 2024-05-07
D1025935 Collimator for a physical vapor deposition (PVD) chamber Luke Vianney Varkey, Xiangjin Xie 2024-05-07
D1025936 Collimator for a physical vapor deposition (PVD) chamber Luke Vianney Varkey, Xiangjin Xie 2024-05-07
D1024149 Collimator for a physical vapor deposition (PVD) chamber Luke Vianney Varkey, Xiangjin Xie 2024-04-23
11915915 Apparatus for generating magnetic fields during semiconductor processing Suhas Bangalore Umesh 2024-02-27
D1009816 Collimator for a physical vapor deposition chamber Keith A. Miller, Fuhong Zhang, Luke Vianney Varkey, Kishor Kalathiparambil, Xiangjin Xie 2024-01-02
11810770 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Keith A. Miller, William Fruchterman +4 more 2023-11-07
D998575 Collimator for use in a physical vapor deposition (PVD) chamber Fuhong Zhang, Lanlan Zhong, Kishor Kalathiparambil 2023-09-12
D997111 Collimator for use in a physical vapor deposition (PVD) chamber Fuhong Zhang, Lanlan Zhong, Kishor Kalathiparambil 2023-08-29
11692262 EM source for enhanced plasma control Alexander Jansen, Keith A. Miller, Prashanth Kothnur, David Gunther, Emily Schooley 2023-07-04
D970566 Sputter target for a physical vapor deposition chamber William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA, Kirankumar Neelasandra SAVANDAIAH 2022-11-22
11492697 Apparatus for improved anode-cathode ratio for rf chambers Kirankumar Neelasandra SAVANDAIAH, Keith A. Miller, Srinivasa Rao YEDLA, Chandrashekar Kenchappa 2022-11-08
11492699 Substrate temperature non-uniformity reduction over target life using spacing compensation Suhas Bangalore Umesh, Preetham Rao, Shirish A. PETHE, Fuhong Zhang, Kishor Kalathiparambil +1 more 2022-11-08
11335577 Methods and apparatus to prevent interference between processing chambers Fuhong Zhang, Sunil Kumar Garg, Paul Kiely, William Fruchterman, Zheng Wang +1 more 2022-05-17
11315771 Methods and apparatus for processing a substrate Xiangjin Xie, Fuhong Zhang, Shirish A. PETHE, Lewis Yuan Tse Lo, Lanlan Zhong +2 more 2022-04-26
11309169 Biasable flux optimizer / collimator for PVD sputter chamber Fuhong Zhang, Anthony Infante, Zheng Wang 2022-04-19
D946638 Target profile for a physical vapor deposition chamber target Fuhong Zhang, Zheng Wang 2022-03-22
D937329 Sputter target for a physical vapor deposition chamber William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA, Kirankumar Neelasandra SAVANDAIAH 2021-11-30
11037768 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Keith A. Miller, William Fruchterman +4 more 2021-06-15